Concurrent design of quasi-random photonic nanostructures

Won Kyu Lee, Shuangcheng Yu, Clifford J. Engel, Thaddeus Reese, Dongjoon Rhee, Wei Chen*, Teri W. Odom

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

34 Scopus citations


Nanostructured surfaces with quasi-random geometries can manipulate light over broadband wavelengths and wide ranges of angles. Optimization and realization of stochastic patterns have typically relied on serial, direct-write fabrication methods combined with real-space design. However, this approach is not suitable for customizable features or scalable nanomanufacturing. Moreover, trial-and-error processing cannot guarantee fabrication feasibility because processing–structure relations are not included in conventional designs. Here, we report wrinkle lithography integrated with concurrent design to produce quasi-random nanostructures in amorphous silicon at wafer scales that achieved over 160% light absorption enhancement from 800 to 1,200 nm. The quasi-periodicity of patterns, materials filling ratio, and feature depths could be independently controlled. We statistically represented the quasi-random patterns by Fourier spectral density functions (SDFs) that could bridge the processing–structure and structure–performance relations. Iterative search of the optimal structure via the SDF representation enabled concurrent design of nanostructures and processing.

Original languageEnglish (US)
Pages (from-to)8734-8739
Number of pages6
JournalProceedings of the National Academy of Sciences of the United States of America
Issue number33
StatePublished - Aug 15 2017


  • Light trapping
  • Pattern transfer
  • Silicon photonics
  • Spectral density function
  • Wrinkles

ASJC Scopus subject areas

  • General


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