Abstract
Ambient liquid phase atomic force microscope (AFM) techniques for nanopatterning organic molecules on silicon through direct Si-C bonds rely on reactions that are in direct competition with spurious oxidation. We study the effectiveness of an inert hydrophobic organic solvent at suppressing oxidation of hydrogen-passivated silicon under ambient conditions. Nanometer scale features were fabricated on an H:Si(111) substrate using a conductive AFM in hexadecane. The patterned features show chemical and kinetic behavior consistent with field induced oxidation (FIO) in air. The mechanism for FIO in hexadecane is discussed.
Original language | English (US) |
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Pages (from-to) | 91-95 |
Number of pages | 5 |
Journal | Nano letters |
Volume | 5 |
Issue number | 1 |
DOIs | |
State | Published - Jan 2005 |
Externally published | Yes |
ASJC Scopus subject areas
- Condensed Matter Physics
- Mechanical Engineering
- Bioengineering
- General Chemistry
- General Materials Science