Conductive atomic force microscope nanopatterning of hydrogen-passivated silicon in inert organic solvents

C. Reagan Kinser, Matthew J. Schmitz, Mark Hersam*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

44 Scopus citations

Abstract

Ambient liquid phase atomic force microscope (AFM) techniques for nanopatterning organic molecules on silicon through direct Si-C bonds rely on reactions that are in direct competition with spurious oxidation. We study the effectiveness of an inert hydrophobic organic solvent at suppressing oxidation of hydrogen-passivated silicon under ambient conditions. Nanometer scale features were fabricated on an H:Si(111) substrate using a conductive AFM in hexadecane. The patterned features show chemical and kinetic behavior consistent with field induced oxidation (FIO) in air. The mechanism for FIO in hexadecane is discussed.

Original languageEnglish (US)
Pages (from-to)91-95
Number of pages5
JournalNano Letters
Volume5
Issue number1
DOIs
StatePublished - Jan 1 2005

ASJC Scopus subject areas

  • Materials Science(all)
  • Electronic, Optical and Magnetic Materials
  • Chemistry (miscellaneous)

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