Abstract
The contact sensing method for dip-pen nanolithography was discussed. Dip-pen nanolithography is capable of generating sub-100 nm features using molecular diffusion of chemicals from a scanning probe tip to a writing surface. The results show that this method has high sensitivity and is suitable for dip-pen nanolithography applications with large probe arrays.
Original language | English (US) |
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Pages (from-to) | 581-583 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 83 |
Issue number | 3 |
DOIs | |
State | Published - Jul 21 2003 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)