Conductivity-based contact sensing for probe arrays in dip-pen nanolithography

Jun Zou; David Bullen; Xuefeng Wang; Chang Liu; Chad A. Mirkin

doi:10.1063/1.1592620

Conductivity-based contact sensing for probe arrays in dip-pen nanolithography

Jun Zou, David Bullen, Xuefeng Wang, Chang Liu^*, Chad A. Mirkin

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

The contact sensing method for dip-pen nanolithography was discussed. Dip-pen nanolithography is capable of generating sub-100 nm features using molecular diffusion of chemicals from a scanning probe tip to a writing surface. The results show that this method has high sensitivity and is suitable for dip-pen nanolithography applications with large probe arrays.

Original language	English (US)
Pages (from-to)	581-583
Number of pages	3
Journal	Applied Physics Letters
Volume	83
Issue number	3
DOIs	https://doi.org/10.1063/1.1592620
State	Published - Jul 21 2003

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1592620

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title = "Conductivity-based contact sensing for probe arrays in dip-pen nanolithography",

abstract = "The contact sensing method for dip-pen nanolithography was discussed. Dip-pen nanolithography is capable of generating sub-100 nm features using molecular diffusion of chemicals from a scanning probe tip to a writing surface. The results show that this method has high sensitivity and is suitable for dip-pen nanolithography applications with large probe arrays.",

author = "Jun Zou and David Bullen and Xuefeng Wang and Chang Liu and Mirkin, {Chad A.}",

year = "2003",

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doi = "10.1063/1.1592620",

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T1 - Conductivity-based contact sensing for probe arrays in dip-pen nanolithography

AU - Zou, Jun

AU - Bullen, David

AU - Wang, Xuefeng

AU - Liu, Chang

AU - Mirkin, Chad A.

PY - 2003/7/21

Y1 - 2003/7/21

N2 - The contact sensing method for dip-pen nanolithography was discussed. Dip-pen nanolithography is capable of generating sub-100 nm features using molecular diffusion of chemicals from a scanning probe tip to a writing surface. The results show that this method has high sensitivity and is suitable for dip-pen nanolithography applications with large probe arrays.

AB - The contact sensing method for dip-pen nanolithography was discussed. Dip-pen nanolithography is capable of generating sub-100 nm features using molecular diffusion of chemicals from a scanning probe tip to a writing surface. The results show that this method has high sensitivity and is suitable for dip-pen nanolithography applications with large probe arrays.

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DO - 10.1063/1.1592620

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EP - 583

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 3

ER -

Conductivity-based contact sensing for probe arrays in dip-pen nanolithography

Abstract

ASJC Scopus subject areas

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