Conformable solid-index phase masks composed of high-aspect-ratio micropillar arrays and their application to 3D nanopatterning

Junyong Park, Jae Hong Park, Eunhye Kim, Chi Won Ahn, Hyun Ik Jang, John A. Rogers, Seokwoo Jeon*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

58 Scopus citations

Abstract

Defect-free and dense micropillar arrays with a high aspect ratio are replicated from etched Si masters using high-modulus polyurethane acrylate. The newly designed conformable solid-index mask can generate high-resolution 3D nanostructures that can be patterned through proximity field nanopatterning (PnP) in a single exposure step. The superb optical property proves the quality of 3D nanostructures.

Original languageEnglish (US)
Pages (from-to)860-864
Number of pages5
JournalAdvanced Materials
Volume23
Issue number7
DOIs
StatePublished - Feb 15 2011

Keywords

  • 3D nanopatterning
  • micropillar arrays
  • nanostructures
  • optical coatings
  • phase masks

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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