Conformational rearrangements in interfacial region of polydimethylsiloxane melt films

Guennadi Evmenenko*, Haiding Mo, Sumit Kewalramani, Pulak Dutta

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations


Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 A°) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value).

Original languageEnglish (US)
Pages (from-to)878-882
Number of pages5
Issue number3
StatePublished - Jan 25 2006


  • Immobilized layer
  • PDMS films
  • X-ray specular reflectivity

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry


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