Conformational rearrangements in interfacial region of polydimethylsiloxane melt films

Guennadi Evmenenko; Haiding Mo; Sumit Kewalramani; Pulak Dutta

doi:10.1016/j.polymer.2005.12.010

Conformational rearrangements in interfacial region of polydimethylsiloxane melt films

Guennadi Evmenenko^*, Haiding Mo, Sumit Kewalramani, Pulak Dutta

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 A°) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value).

Original language	English (US)
Pages (from-to)	878-882
Number of pages	5
Journal	Polymer
Volume	47
Issue number	3
DOIs	https://doi.org/10.1016/j.polymer.2005.12.010
State	Published - Jan 25 2006

Keywords

Immobilized layer
PDMS films
X-ray specular reflectivity

ASJC Scopus subject areas

Organic Chemistry
Polymers and Plastics
Materials Chemistry

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10.1016/j.polymer.2005.12.010

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title = "Conformational rearrangements in interfacial region of polydimethylsiloxane melt films",

abstract = "Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 A°) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value).",

keywords = "Immobilized layer, PDMS films, X-ray specular reflectivity",

author = "Guennadi Evmenenko and Haiding Mo and Sumit Kewalramani and Pulak Dutta",

note = "Funding Information: This work was supported by the US National Science Foundation under grant no. DMR-0305494. XRR measurements were performed at beam lines X23B of the National Synchrotron Light Source and the MRCAT of the Advanced Photon Source, which are supported by the US Department of Energy.",

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doi = "10.1016/j.polymer.2005.12.010",

language = "English (US)",

volume = "47",

pages = "878--882",

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T1 - Conformational rearrangements in interfacial region of polydimethylsiloxane melt films

AU - Evmenenko, Guennadi

AU - Mo, Haiding

AU - Kewalramani, Sumit

AU - Dutta, Pulak

N1 - Funding Information: This work was supported by the US National Science Foundation under grant no. DMR-0305494. XRR measurements were performed at beam lines X23B of the National Synchrotron Light Source and the MRCAT of the Advanced Photon Source, which are supported by the US Department of Energy.

PY - 2006/1/25

Y1 - 2006/1/25

N2 - Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 A°) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value).

AB - Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 A°) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value).

KW - Immobilized layer

KW - PDMS films

KW - X-ray specular reflectivity

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U2 - 10.1016/j.polymer.2005.12.010

DO - 10.1016/j.polymer.2005.12.010

M3 - Article

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SP - 878

EP - 882

JO - Polymer

JF - Polymer

IS - 3

ER -

Conformational rearrangements in interfacial region of polydimethylsiloxane melt films

Abstract

Keywords

ASJC Scopus subject areas

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