Continuum modeling of van der Waals interactions between carbon nanotube walls

W. B. Lu, B. Liu*, J. Wu, J. Xiao, K. C. Hwang, S. Y. Fu, Yonggang Huang

*Corresponding author for this work

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

Prior continuum models of van der Waals force between carbon nanotube walls assume that the pressures be either the same on the walls or inversely proportional to wall radius. A new continuum model is obtained analytically from the Lennard-Jones potential for van der Waals force, without the above assumptions. Buckling of a double-wall carbon nanotube under external pressure is studied, and the critical buckling pressure is much smaller than those models involving the above assumptions.

Original languageEnglish (US)
Article number101917
JournalApplied Physics Letters
Volume94
Issue number10
DOIs
StatePublished - Mar 24 2009

Fingerprint

continuum modeling
carbon nanotubes
Van der Waals forces
buckling
interactions
continuums
Lennard-Jones potential
radii

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Lu, W. B. ; Liu, B. ; Wu, J. ; Xiao, J. ; Hwang, K. C. ; Fu, S. Y. ; Huang, Yonggang. / Continuum modeling of van der Waals interactions between carbon nanotube walls. In: Applied Physics Letters. 2009 ; Vol. 94, No. 10.
@article{8743a90889d141c0b4f7f7542f61c89c,
title = "Continuum modeling of van der Waals interactions between carbon nanotube walls",
abstract = "Prior continuum models of van der Waals force between carbon nanotube walls assume that the pressures be either the same on the walls or inversely proportional to wall radius. A new continuum model is obtained analytically from the Lennard-Jones potential for van der Waals force, without the above assumptions. Buckling of a double-wall carbon nanotube under external pressure is studied, and the critical buckling pressure is much smaller than those models involving the above assumptions.",
author = "Lu, {W. B.} and B. Liu and J. Wu and J. Xiao and Hwang, {K. C.} and Fu, {S. Y.} and Yonggang Huang",
year = "2009",
month = "3",
day = "24",
doi = "10.1063/1.3099023",
language = "English (US)",
volume = "94",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "10",

}

Continuum modeling of van der Waals interactions between carbon nanotube walls. / Lu, W. B.; Liu, B.; Wu, J.; Xiao, J.; Hwang, K. C.; Fu, S. Y.; Huang, Yonggang.

In: Applied Physics Letters, Vol. 94, No. 10, 101917, 24.03.2009.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Continuum modeling of van der Waals interactions between carbon nanotube walls

AU - Lu, W. B.

AU - Liu, B.

AU - Wu, J.

AU - Xiao, J.

AU - Hwang, K. C.

AU - Fu, S. Y.

AU - Huang, Yonggang

PY - 2009/3/24

Y1 - 2009/3/24

N2 - Prior continuum models of van der Waals force between carbon nanotube walls assume that the pressures be either the same on the walls or inversely proportional to wall radius. A new continuum model is obtained analytically from the Lennard-Jones potential for van der Waals force, without the above assumptions. Buckling of a double-wall carbon nanotube under external pressure is studied, and the critical buckling pressure is much smaller than those models involving the above assumptions.

AB - Prior continuum models of van der Waals force between carbon nanotube walls assume that the pressures be either the same on the walls or inversely proportional to wall radius. A new continuum model is obtained analytically from the Lennard-Jones potential for van der Waals force, without the above assumptions. Buckling of a double-wall carbon nanotube under external pressure is studied, and the critical buckling pressure is much smaller than those models involving the above assumptions.

UR - http://www.scopus.com/inward/record.url?scp=62549126949&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=62549126949&partnerID=8YFLogxK

U2 - 10.1063/1.3099023

DO - 10.1063/1.3099023

M3 - Article

VL - 94

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 10

M1 - 101917

ER -