INIS
control
11%
data
11%
deposition
22%
electrical properties
33%
electron diffraction
22%
field effect transistors
22%
films
77%
growth
11%
indium
66%
lasers
11%
layers
11%
mobility
33%
optical properties
22%
oxygen
11%
partial pressure
11%
saturation
11%
semiconductor materials
11%
substrates
11%
thin films
11%
tin
11%
tin oxides
55%
yields
11%
zinc
66%
Physics
Amorphous Materials
11%
Boundaries
11%
Conductor
11%
Crystallinity
22%
Diffraction Pattern
22%
Electrical Properties
33%
Electron Diffraction
22%
Field Effect
11%
Indium
11%
Mobility
33%
Optical Properties
22%
Pulsed Laser Deposition
11%
Ratios
11%
Semiconductor
11%
Substitutes
11%
Substrates
11%
Thin Films
11%
Tin
11%
Zinc
11%
Engineering
Channel Layer
11%
Crystallinity
22%
Deposited Film
11%
Deposition Temperature
11%
Electron Diffraction
22%
Field-Effect Transistor
22%
Indium-Tin-Oxide
55%
Oxide Film
100%
Oxygen Partial Pressure
11%
Substrates
11%
Thin Films
11%
Yields
11%
Material Science
Amorphous Material
44%
Characterization
11%
Film Growth
11%
Liquid Films
11%
Saturation
11%
Semiconductor Material
11%
Thin Films
11%