Conventional and ionized magnetron sputter-deposition of nanocrystalline titanium diboride thin films

Mei Ling Wu*, Xi Wei Lin, Vinayak P Dravid, Yip-Wah Chung, Ming Show Wong, William D. Sproul

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

Titanium diboride has many interesting physical and chemical properties that make it attractive as a tribological coating material. We focus our study on the relationship between hardness, crystal structure and processing parameters for TiB2 thin films produced by conventional and ionized magnetron sputtering. When synthesized by conventional magnetron sputtering, TiB2 films with the highest degree of crystallinity have the highest hardness and are obtainable at an optimum combination of argon pressure and substrate bias. The films also show strong (0001) texture. Such high degree of crystallinity can be obtained without substrate bias by ionized magnetron sputtering, in which enhanced ionization of the plasma is obtained by inductively coupling RF power in the region between the magnetron target and the substrate.

Original languageEnglish (US)
Pages (from-to)131-134
Number of pages4
JournalTribology Letters
Volume5
Issue number2-3
StatePublished - Dec 1 1998

Keywords

  • Coating
  • Hardness
  • Magnetron sputtering
  • Nanoindentation
  • Titanium diboride

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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