Correcting for spherical aberrations in solid immersion microscopy using a deformable mirror

Y. Lu; E. Ramsay; C. Stockbridge; F. H. Koklu; A. Yurt; J. Mertz; T. G. Bifano; M. S. Ünlü; B. B. Goldberg

Correcting for spherical aberrations in solid immersion microscopy using a deformable mirror

Y. Lu^*, E. Ramsay, C. Stockbridge, F. H. Koklu, A. Yurt, J. Mertz, T. G. Bifano, M. S. Ünlü, B. B. Goldberg

^*Corresponding author for this work

Physics and Astronomy

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We present a method for correcting spherical aberrations in solid immersion microscopy through the use of a deformable mirror. Aberrations in solid immersion imaging for failure analysis can be induced through off-axis imaging, errors in lens fabrication or mismatch of design and substrate wafer thickness. RMS wavefront error correction of 30% is demonstrated in the case of substrate wafer thickness error.

Original language	English (US)
Title of host publication	ISTFA 2011 - Conference Proceedings from the 37th International Symposium for Testing and Failure Analysis
Pages	26-30
Number of pages	5
State	Published - Dec 1 2011
Event	37th International Symposium for Testing and Failure Analysis, ISTFA 2011 - San Jose, CA, United States Duration: Nov 13 2011 → Nov 17 2011

Other

Other	37th International Symposium for Testing and Failure Analysis, ISTFA 2011
Country/Territory	United States
City	San Jose, CA
Period	11/13/11 → 11/17/11

ASJC Scopus subject areas

Electrical and Electronic Engineering
Control and Systems Engineering
Safety, Risk, Reliability and Quality

Cite this

@inproceedings{93ff077ec7ef4f2eaa768633dee4ecdb,

title = "Correcting for spherical aberrations in solid immersion microscopy using a deformable mirror",

abstract = "We present a method for correcting spherical aberrations in solid immersion microscopy through the use of a deformable mirror. Aberrations in solid immersion imaging for failure analysis can be induced through off-axis imaging, errors in lens fabrication or mismatch of design and substrate wafer thickness. RMS wavefront error correction of 30% is demonstrated in the case of substrate wafer thickness error.",

author = "Y. Lu and E. Ramsay and C. Stockbridge and Koklu, {F. H.} and A. Yurt and J. Mertz and Bifano, {T. G.} and {\"U}nl{\"u}, {M. S.} and Goldberg, {B. B.}",

year = "2011",

month = dec,

day = "1",

language = "English (US)",

isbn = "9781615038268",

pages = "26--30",

booktitle = "ISTFA 2011 - Conference Proceedings from the 37th International Symposium for Testing and Failure Analysis",

note = "37th International Symposium for Testing and Failure Analysis, ISTFA 2011 ; Conference date: 13-11-2011 Through 17-11-2011",

}

Lu, Y, Ramsay, E, Stockbridge, C, Koklu, FH, Yurt, A, Mertz, J, Bifano, TG, Ünlü, MS & Goldberg, BB 2011, Correcting for spherical aberrations in solid immersion microscopy using a deformable mirror. in ISTFA 2011 - Conference Proceedings from the 37th International Symposium for Testing and Failure Analysis. pp. 26-30, 37th International Symposium for Testing and Failure Analysis, ISTFA 2011, San Jose, CA, United States, 11/13/11.

TY - GEN

T1 - Correcting for spherical aberrations in solid immersion microscopy using a deformable mirror

AU - Lu, Y.

AU - Ramsay, E.

AU - Stockbridge, C.

AU - Koklu, F. H.

AU - Yurt, A.

AU - Mertz, J.

AU - Bifano, T. G.

AU - Ünlü, M. S.

AU - Goldberg, B. B.

PY - 2011/12/1

Y1 - 2011/12/1

N2 - We present a method for correcting spherical aberrations in solid immersion microscopy through the use of a deformable mirror. Aberrations in solid immersion imaging for failure analysis can be induced through off-axis imaging, errors in lens fabrication or mismatch of design and substrate wafer thickness. RMS wavefront error correction of 30% is demonstrated in the case of substrate wafer thickness error.

AB - We present a method for correcting spherical aberrations in solid immersion microscopy through the use of a deformable mirror. Aberrations in solid immersion imaging for failure analysis can be induced through off-axis imaging, errors in lens fabrication or mismatch of design and substrate wafer thickness. RMS wavefront error correction of 30% is demonstrated in the case of substrate wafer thickness error.

UR - http://www.scopus.com/inward/record.url?scp=84869814657&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84869814657&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84869814657

SN - 9781615038268

SP - 26

EP - 30

BT - ISTFA 2011 - Conference Proceedings from the 37th International Symposium for Testing and Failure Analysis

T2 - 37th International Symposium for Testing and Failure Analysis, ISTFA 2011

Y2 - 13 November 2011 through 17 November 2011

ER -

Correcting for spherical aberrations in solid immersion microscopy using a deformable mirror

Abstract

Other

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this