Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers

Yong Qing Ma; Alfred Cerezo; Alexander Georgalakis; Amanda K. Petford-Long; Steve P. Bozeman; Heather Bown; Peter H. Clifton; David J. Larson

Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers

Yong Qing Ma^*, Alfred Cerezo, Alexander Georgalakis, Amanda K. Petford-Long, Steve P. Bozeman, Heather Bown, Peter H. Clifton, David J. Larson

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

The correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers was studied. The lower pinhole density and lower interfacial roughness in the Cu layers lead to higher magnetoresistance than for the 12 mTorr deposition. After annealing, the magnetoresistance was found to decrease for deposition pressures.

Original language	English (US)
Pages (from-to)	GS05
Journal	Digests of the Intermag Conference
State	Published - Dec 1 2002
Event	2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG - Amsterdam, Netherlands Duration: Apr 28 2002 → May 2 2002

ASJC Scopus subject areas

Electrical and Electronic Engineering

Cite this

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title = "Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers",

abstract = "The correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers was studied. The lower pinhole density and lower interfacial roughness in the Cu layers lead to higher magnetoresistance than for the 12 mTorr deposition. After annealing, the magnetoresistance was found to decrease for deposition pressures.",

author = "Ma, {Yong Qing} and Alfred Cerezo and Alexander Georgalakis and Petford-Long, {Amanda K.} and Bozeman, {Steve P.} and Heather Bown and Clifton, {Peter H.} and Larson, {David J.}",

year = "2002",

month = dec,

day = "1",

language = "English (US)",

pages = "GS05",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG ; Conference date: 28-04-2002 Through 02-05-2002",

}

TY - JOUR

T1 - Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers

AU - Ma, Yong Qing

AU - Cerezo, Alfred

AU - Georgalakis, Alexander

AU - Petford-Long, Amanda K.

AU - Bozeman, Steve P.

AU - Bown, Heather

AU - Clifton, Peter H.

AU - Larson, David J.

PY - 2002/12/1

Y1 - 2002/12/1

N2 - The correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers was studied. The lower pinhole density and lower interfacial roughness in the Cu layers lead to higher magnetoresistance than for the 12 mTorr deposition. After annealing, the magnetoresistance was found to decrease for deposition pressures.

AB - The correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers was studied. The lower pinhole density and lower interfacial roughness in the Cu layers lead to higher magnetoresistance than for the 12 mTorr deposition. After annealing, the magnetoresistance was found to decrease for deposition pressures.

UR - http://www.scopus.com/inward/record.url?scp=18144446793&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=18144446793&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:18144446793

SN - 0074-6843

SP - GS05

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

T2 - 2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG

Y2 - 28 April 2002 through 2 May 2002

ER -

Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers

Abstract

ASJC Scopus subject areas

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