Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers

Y. Q. Ma; A. Cerezo; A. Georgalakis; A. K. Petford-Long; S. P. Bozeman; H. Bown; P. H. Clifton; D. J. Larson

doi:10.1109/INTMAG.2002.1001471

Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers

Y. Q. Ma, A. Cerezo, A. Georgalakis, A. K. Petford-Long, S. P. Bozeman, H. Bown, P. H. Clifton, D. J. Larson

Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Correlation of magnetoresistance to nanoscale microstructural properties is desirable for optimization of multilayer films designed for magnetic recording applications. Recently, the characterization technique of three-dimensional atom probe (3DAP) analysis has been successfully applied to such structures. Unlike techniques such as x-ray diffraction or transmission microscopy, 3DAP has the capability to deconvolute chemical mixing at multilayer interfaces from morphological roughness. In the current work, a multilayer stack consisting of Si/seed/CoFe/(Cu/CoFe)x5/cap has been studied.

Original language	English (US)
Title of host publication	INTERMAG Europe 2002 - IEEE International Magnetics Conference
Editors	J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	0780373650, 9780780373655
DOIs	https://doi.org/10.1109/INTMAG.2002.1001471
State	Published - 2002
Event	2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands Duration: Apr 28 2002 → May 2 2002

Publication series

Name	INTERMAG Europe 2002 - IEEE International Magnetics Conference

Other

Other	2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
Country/Territory	Netherlands
City	Amsterdam
Period	4/28/02 → 5/2/02

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering
Surfaces, Coatings and Films

Access to Document

10.1109/INTMAG.2002.1001471

Cite this

Ma, Y. Q., Cerezo, A., Georgalakis, A., Petford-Long, A. K., Bozeman, S. P., Bown, H., Clifton, P. H., & Larson, D. J. (2002). Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers. In J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, J. De Boeck, & R. Wood (Eds.), INTERMAG Europe 2002 - IEEE International Magnetics Conference Article 1001471 (INTERMAG Europe 2002 - IEEE International Magnetics Conference). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2002.1001471

Ma, Y. Q. ; Cerezo, A. ; Georgalakis, A. et al. / Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers. INTERMAG Europe 2002 - IEEE International Magnetics Conference. editor / J. Fidler ; B. Hillebrands ; C. Ross ; D. Weller ; L. Folks ; E. Hill ; M. Vazquez Villalabeitia ; J. A. Bain ; Jo De Boeck ; R. Wood. Institute of Electrical and Electronics Engineers Inc., 2002. (INTERMAG Europe 2002 - IEEE International Magnetics Conference).

@inproceedings{c5196d9126b14bdebb17b2b1623951fa,

title = "Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers",

abstract = "Correlation of magnetoresistance to nanoscale microstructural properties is desirable for optimization of multilayer films designed for magnetic recording applications. Recently, the characterization technique of three-dimensional atom probe (3DAP) analysis has been successfully applied to such structures. Unlike techniques such as x-ray diffraction or transmission microscopy, 3DAP has the capability to deconvolute chemical mixing at multilayer interfaces from morphological roughness. In the current work, a multilayer stack consisting of Si/seed/CoFe/(Cu/CoFe)x5/cap has been studied.",

author = "Ma, {Y. Q.} and A. Cerezo and A. Georgalakis and Petford-Long, {A. K.} and Bozeman, {S. P.} and H. Bown and Clifton, {P. H.} and Larson, {D. J.}",

note = "Publisher Copyright: {\textcopyright}2002 IEEE.; 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 ; Conference date: 28-04-2002 Through 02-05-2002",

year = "2002",

doi = "10.1109/INTMAG.2002.1001471",

language = "English (US)",

series = "INTERMAG Europe 2002 - IEEE International Magnetics Conference",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

editor = "J. Fidler and B. Hillebrands and C. Ross and D. Weller and L. Folks and E. Hill and {Vazquez Villalabeitia}, M. and Bain, {J. A.} and {De Boeck}, Jo and R. Wood",

booktitle = "INTERMAG Europe 2002 - IEEE International Magnetics Conference",

address = "United States",

}

Ma, YQ, Cerezo, A, Georgalakis, A, Petford-Long, AK, Bozeman, SP, Bown, H, Clifton, PH & Larson, DJ 2002, Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers. in J Fidler, B Hillebrands, C Ross, D Weller, L Folks, E Hill, M Vazquez Villalabeitia, JA Bain, J De Boeck & R Wood (eds), INTERMAG Europe 2002 - IEEE International Magnetics Conference., 1001471, INTERMAG Europe 2002 - IEEE International Magnetics Conference, Institute of Electrical and Electronics Engineers Inc., 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002, Amsterdam, Netherlands, 4/28/02. https://doi.org/10.1109/INTMAG.2002.1001471

Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers. / Ma, Y. Q.; Cerezo, A.; Georgalakis, A. et al.
INTERMAG Europe 2002 - IEEE International Magnetics Conference. ed. / J. Fidler; B. Hillebrands; C. Ross; D. Weller; L. Folks; E. Hill; M. Vazquez Villalabeitia; J. A. Bain; Jo De Boeck; R. Wood. Institute of Electrical and Electronics Engineers Inc., 2002. 1001471 (INTERMAG Europe 2002 - IEEE International Magnetics Conference).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers

AU - Ma, Y. Q.

AU - Cerezo, A.

AU - Georgalakis, A.

AU - Petford-Long, A. K.

AU - Bozeman, S. P.

AU - Bown, H.

AU - Clifton, P. H.

AU - Larson, D. J.

PY - 2002

Y1 - 2002

N2 - Correlation of magnetoresistance to nanoscale microstructural properties is desirable for optimization of multilayer films designed for magnetic recording applications. Recently, the characterization technique of three-dimensional atom probe (3DAP) analysis has been successfully applied to such structures. Unlike techniques such as x-ray diffraction or transmission microscopy, 3DAP has the capability to deconvolute chemical mixing at multilayer interfaces from morphological roughness. In the current work, a multilayer stack consisting of Si/seed/CoFe/(Cu/CoFe)x5/cap has been studied.

AB - Correlation of magnetoresistance to nanoscale microstructural properties is desirable for optimization of multilayer films designed for magnetic recording applications. Recently, the characterization technique of three-dimensional atom probe (3DAP) analysis has been successfully applied to such structures. Unlike techniques such as x-ray diffraction or transmission microscopy, 3DAP has the capability to deconvolute chemical mixing at multilayer interfaces from morphological roughness. In the current work, a multilayer stack consisting of Si/seed/CoFe/(Cu/CoFe)x5/cap has been studied.

UR - http://www.scopus.com/inward/record.url?scp=85017269271&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85017269271&partnerID=8YFLogxK

U2 - 10.1109/INTMAG.2002.1001471

DO - 10.1109/INTMAG.2002.1001471

M3 - Conference contribution

AN - SCOPUS:85017269271

T3 - INTERMAG Europe 2002 - IEEE International Magnetics Conference

BT - INTERMAG Europe 2002 - IEEE International Magnetics Conference

A2 - Fidler, J.

A2 - Hillebrands, B.

A2 - Ross, C.

A2 - Weller, D.

A2 - Folks, L.

A2 - Hill, E.

A2 - Vazquez Villalabeitia, M.

A2 - Bain, J. A.

A2 - De Boeck, Jo

A2 - Wood, R.

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002

Y2 - 28 April 2002 through 2 May 2002

ER -

Ma YQ, Cerezo A, Georgalakis A, Petford-Long AK, Bozeman SP, Bown H et al. Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers. In Fidler J, Hillebrands B, Ross C, Weller D, Folks L, Hill E, Vazquez Villalabeitia M, Bain JA, De Boeck J, Wood R, editors, INTERMAG Europe 2002 - IEEE International Magnetics Conference. Institute of Electrical and Electronics Engineers Inc. 2002. 1001471. (INTERMAG Europe 2002 - IEEE International Magnetics Conference). doi: 10.1109/INTMAG.2002.1001471

Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers

Abstract

Publication series

Other

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this