Corrosion performance of ultrathin carbon nitride overcoats synthesized by magnetron sputtering

M. U. Guruz*, V. P. Dravid, Y. W. Chung, M. M. Lacerda, C. S. Bhatia, Y. H. Yu, S. C. Lee

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

26 Scopus citations

Abstract

Ultrathin films of carbon nitride were grown using d.c. magnetron sputtering in a single cathode deposition system. A high frequency pulsed bias was applied to both the target and the substrate during deposition to help sustain a stable plasma and enhance ion bombardment of the growing film. These films exhibit excellent corrosion resistance at film thickness down to 1 nm. Atomic force microscopy measurements reveal an atomically smooth surface. The role of pulsed bias and bombardment by ionized species in obtaining low defect-density coatings is discussed.

Original languageEnglish (US)
Pages (from-to)6-9
Number of pages4
JournalThin Solid Films
Volume381
Issue number1
DOIs
StatePublished - Jan 2 2001

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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