Abstract
Ultrathin films of carbon nitride were grown using d.c. magnetron sputtering in a single cathode deposition system. A high frequency pulsed bias was applied to both the target and the substrate during deposition to help sustain a stable plasma and enhance ion bombardment of the growing film. These films exhibit excellent corrosion resistance at film thickness down to 1 nm. Atomic force microscopy measurements reveal an atomically smooth surface. The role of pulsed bias and bombardment by ionized species in obtaining low defect-density coatings is discussed.
Original language | English (US) |
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Pages (from-to) | 6-9 |
Number of pages | 4 |
Journal | Thin Solid Films |
Volume | 381 |
Issue number | 1 |
DOIs | |
State | Published - Jan 2 2001 |
Funding
The authors wish to acknowledge the NSF MRSEC program (grant No.: DMR-9632472), NSIC EHDR program for their financial support and Keith Martin for assistance during ellipsometry measurements.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry