(Co+Si)/Pd films with a high perpendicular magnetic anisotropy

Y. H. Kim*, A. K. Petford-Long, J. P. Jakubovics

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Co/Pd layered films with Si added to the Co layers have been found to show a high perpendicular anisotropy with K2.1×105 J m-3, good coercivity, high coercivity ratio, and high remanence ratio. Samples with thin (Co+Si) layers contain uniform, narrow stripe domains. The microstructure consists of a large-scale polycrystalline structure, a fine-scale structure that may be amorphous, and a banded structure in which CoSi-rich and CoSi2-rich regions are separated, in addition to regions of Co-Pd alloy and Pd. Clear interfaces between the (Co+Si) and the Pd layers were not found.

Original languageEnglish (US)
Pages (from-to)3552-3555
Number of pages4
JournalPhysical Review B
Issue number5
StatePublished - Jan 1 1993

ASJC Scopus subject areas

  • Condensed Matter Physics


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