Abstract
We show that very narrow fin-like periodic nanostructure with 0.1 μm width, 1 μm depth, and a few microns length can be fabricated on AlGaAs using Chemically-Assited-Ion-Beam-Etching with oxidized AlGaAs as negative mask. This technique may have applications to nanoscale devices fabrication.
Original language | English (US) |
---|---|
Pages (from-to) | 59-62 |
Number of pages | 4 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 3551 |
State | Published - Dec 1 1998 |
Event | Proceedings of the 1998 Conference on Integrated Optoelectronics II - Beijing, China Duration: Sep 18 1998 → Sep 19 1998 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering