Deep Ultraviolet Nonlinear Optical Materials

T. Thao Tran; Hongwei Yu; James M. Rondinelli; Kenneth R. Poeppelmeier; P. Shiv Halasyamani

doi:10.1021/acs.chemmater.6b02366

Deep Ultraviolet Nonlinear Optical Materials

T. Thao Tran, Hongwei Yu, James M. Rondinelli, Kenneth R. Poeppelmeier, P. Shiv Halasyamani^*

^*Corresponding author for this work

Research output: Contribution to journal › Review article › peer-review

475 Scopus citations

Abstract

Deep ultraviolet (absorption edge <200 nm, band gap >6.2 eV) nonlinear optical (NLO) materials are of current interest owing to their technological applications and materials design challenges. Technologically, the materials are used in laser systems, atto-second pulse generation, semiconductor manufacturing, and photolithography. Designing and synthesizing a deep UV NLO material requires crystallographic non-centrosymmetry, a wide UV transparency range, a large second-harmonic generating coefficient (d_ij > 0.39 pm/V), moderate birefringence (δn ∼ 0.07), chemical stability and resistance to laser damage, and ease in the growth of large high-quality single crystals. This review examines the known deep UV NLO materials with respect to their crystal structure, band gap, SHG efficiency, laser damage threshold, and birefringence. Finally, future directions with respect to new deep UV NLO materials are discussed.

Original language	English (US)
Pages (from-to)	5238-5258
Number of pages	21
Journal	Chemistry of Materials
Volume	28
Issue number	15
DOIs	https://doi.org/10.1021/acs.chemmater.6b02366
State	Published - Aug 9 2016

Funding

TTT, HY, and PSH thank the Welch Foundation (Grant E- 1457), the National Science Foundation (DMR-1503573), and the Texas Center for Superconductivity for support. KRP thanks the National Science Foundation (DMR-1307698) for support. JMR is supported by the National Science Foundation (NSF) through award number DMR-1454688. We also thank A.N. Halasyamani for greatly improving Figure 1).

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering
Materials Chemistry

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10.1021/acs.chemmater.6b02366

Cite this

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title = "Deep Ultraviolet Nonlinear Optical Materials",

abstract = "Deep ultraviolet (absorption edge <200 nm, band gap >6.2 eV) nonlinear optical (NLO) materials are of current interest owing to their technological applications and materials design challenges. Technologically, the materials are used in laser systems, atto-second pulse generation, semiconductor manufacturing, and photolithography. Designing and synthesizing a deep UV NLO material requires crystallographic non-centrosymmetry, a wide UV transparency range, a large second-harmonic generating coefficient (dij > 0.39 pm/V), moderate birefringence (δn ∼ 0.07), chemical stability and resistance to laser damage, and ease in the growth of large high-quality single crystals. This review examines the known deep UV NLO materials with respect to their crystal structure, band gap, SHG efficiency, laser damage threshold, and birefringence. Finally, future directions with respect to new deep UV NLO materials are discussed.",

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AU - Halasyamani, P. Shiv

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AB - Deep ultraviolet (absorption edge <200 nm, band gap >6.2 eV) nonlinear optical (NLO) materials are of current interest owing to their technological applications and materials design challenges. Technologically, the materials are used in laser systems, atto-second pulse generation, semiconductor manufacturing, and photolithography. Designing and synthesizing a deep UV NLO material requires crystallographic non-centrosymmetry, a wide UV transparency range, a large second-harmonic generating coefficient (dij > 0.39 pm/V), moderate birefringence (δn ∼ 0.07), chemical stability and resistance to laser damage, and ease in the growth of large high-quality single crystals. This review examines the known deep UV NLO materials with respect to their crystal structure, band gap, SHG efficiency, laser damage threshold, and birefringence. Finally, future directions with respect to new deep UV NLO materials are discussed.

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Deep Ultraviolet Nonlinear Optical Materials

Abstract

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ASJC Scopus subject areas

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