Deflection for a magnetostrictive thin film bimorph in a magnetic field

Xiaoli Wang*, Lien Hoffmann, Jian Cao, Melville P Ulmer, Michael E. Graham, Julia Savoie, Semyon Vaynman

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Scopus citations


Magnetostrictive materials were investigated as a means to correct the shape of a thin-wall X-ray telescope surface. Sputter-deposited magnetostrictive films on the glass and Ni substrate were prepared to realize the requirement of deformation under an external magnetic field. The profiles of thin-film specimens were measured under an external magnetic field with White Light Interferometry. The distribution of the external magnetic field around the specimen in the experiments was discussed. In addition, a theoretical analysis was conducted to calculate the residual stress in the specimen and the possible deformation generated by the magnetic field. Preliminary experimental results confirmed that the magnetic field had an effect on the deformation of the magnetostrictive thin film bimorph prepared by sputter-deposition. Directions for future work were presented towards the goal of enabling the application of magnetostrictive thin film as an adaptive optics for X-ray mirrors.

Original languageEnglish (US)
Title of host publication40th North American Manufacturing Research Conference 2012 - Transactions of the North American Manufacturing Research Institution of SME
Number of pages7
StatePublished - Nov 28 2012
Event40th Annual North American Manufacturing Research Conference, NAMRC40 - Notre Dame, IN, United States
Duration: Jun 4 2012Jun 8 2012


Other40th Annual North American Manufacturing Research Conference, NAMRC40
Country/TerritoryUnited States
CityNotre Dame, IN


  • KelvinAll®
  • Magnetostriction
  • Residual stress
  • Thin film

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering


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