Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach

Jing Zhao; Henry O. Marcy; Lauren M. Tonge; Bruce W. Wessels; Tobin J. Marks; Carl R. Kannewurf

doi:10.1016/0038-1098(90)90716-O

Deposition of high-T_c superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach

Jing Zhao^*, Henry O. Marcy, Lauren M. Tonge, Bruce W. Wessels, Tobin J. Marks, Carl R. Kannewurf

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

A plasma-enhanced organometallic chemical vapor deposition process is reported for the preparation of YBa₂Cu₃O_7-x thin films using two differing rf plasma coupling configurations. For films grown under a direct plasma glow, the YBa₂Cu₃O_7-x phase is not produced in the asdeposited state. However, when plasma-activated nitrous oxide is used as the reactant gas in a downstream reactor configuration, superconducting YBa₂Cu₃O_7-x films are formed in situ at a substrate temperature of 610°C. Such films have a low carbon content and a mirror-like surface which is free of voids. These preliminary results indicate that the low temperature fabrication of high-T_c superconducting oxide films by plasma-enhanced organometallic chemical vapor deposition is feasible.

Original language	English (US)
Pages (from-to)	1091-1094
Number of pages	4
Journal	Solid State Communications
Volume	74
Issue number	10
DOIs	https://doi.org/10.1016/0038-1098(90)90716-O
State	Published - Jun 1990

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Materials Chemistry

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10.1016/0038-1098(90)90716-O

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@article{22c4a8f0b272471988f782b956386396,

title = "Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach",

abstract = "A plasma-enhanced organometallic chemical vapor deposition process is reported for the preparation of YBa2Cu3O7-x thin films using two differing rf plasma coupling configurations. For films grown under a direct plasma glow, the YBa2Cu3O7-x phase is not produced in the asdeposited state. However, when plasma-activated nitrous oxide is used as the reactant gas in a downstream reactor configuration, superconducting YBa2Cu3O7-x films are formed in situ at a substrate temperature of 610°C. Such films have a low carbon content and a mirror-like surface which is free of voids. These preliminary results indicate that the low temperature fabrication of high-Tc superconducting oxide films by plasma-enhanced organometallic chemical vapor deposition is feasible.",

author = "Jing Zhao and Marcy, {Henry O.} and Tonge, {Lauren M.} and Wessels, {Bruce W.} and Marks, {Tobin J.} and Kannewurf, {Carl R.}",

note = "Funding Information: Acknowlded~--This research was supported by the National Science Foundation through the Northwestern Materials Research Center (Grant DMR 8821571) and through the Science and Technology Center for High Temperature Superconductivity (Grant DMR 8809854).",

year = "1990",

month = jun,

doi = "10.1016/0038-1098(90)90716-O",

language = "English (US)",

volume = "74",

pages = "1091--1094",

journal = "Solid State Communications",

issn = "0038-1098",

publisher = "Elsevier Limited",

number = "10",

}

TY - JOUR

T1 - Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach

AU - Zhao, Jing

AU - Marcy, Henry O.

AU - Tonge, Lauren M.

AU - Wessels, Bruce W.

AU - Marks, Tobin J.

AU - Kannewurf, Carl R.

N1 - Funding Information: Acknowlded~--This research was supported by the National Science Foundation through the Northwestern Materials Research Center (Grant DMR 8821571) and through the Science and Technology Center for High Temperature Superconductivity (Grant DMR 8809854).

PY - 1990/6

Y1 - 1990/6

N2 - A plasma-enhanced organometallic chemical vapor deposition process is reported for the preparation of YBa2Cu3O7-x thin films using two differing rf plasma coupling configurations. For films grown under a direct plasma glow, the YBa2Cu3O7-x phase is not produced in the asdeposited state. However, when plasma-activated nitrous oxide is used as the reactant gas in a downstream reactor configuration, superconducting YBa2Cu3O7-x films are formed in situ at a substrate temperature of 610°C. Such films have a low carbon content and a mirror-like surface which is free of voids. These preliminary results indicate that the low temperature fabrication of high-Tc superconducting oxide films by plasma-enhanced organometallic chemical vapor deposition is feasible.

AB - A plasma-enhanced organometallic chemical vapor deposition process is reported for the preparation of YBa2Cu3O7-x thin films using two differing rf plasma coupling configurations. For films grown under a direct plasma glow, the YBa2Cu3O7-x phase is not produced in the asdeposited state. However, when plasma-activated nitrous oxide is used as the reactant gas in a downstream reactor configuration, superconducting YBa2Cu3O7-x films are formed in situ at a substrate temperature of 610°C. Such films have a low carbon content and a mirror-like surface which is free of voids. These preliminary results indicate that the low temperature fabrication of high-Tc superconducting oxide films by plasma-enhanced organometallic chemical vapor deposition is feasible.

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U2 - 10.1016/0038-1098(90)90716-O

DO - 10.1016/0038-1098(90)90716-O

M3 - Article

AN - SCOPUS:0025437172

SN - 0038-1098

VL - 74

SP - 1091

EP - 1094

JO - Solid State Communications

JF - Solid State Communications

IS - 10

ER -

Deposition of high-T_c superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach

Abstract

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