Keyphrases
Deposition Structure
100%
Stabilized Zirconia
100%
Cermet
100%
Deposit Properties
100%
Impedance Spectroscopy
20%
Volume Fraction
20%
Annealing
20%
Electrode Materials
20%
Zirconium Dioxide
20%
Electrochemical Devices
20%
Resistivity
20%
Yttrium Oxide
20%
Gradual Increase
20%
YSZ Electrolyte
20%
Interfacial Resistance
20%
Air Electrode
20%
Ag Electrode
20%
Total Pressure
20%
Capping Layer
20%
Annealed Films
20%
Deposition Conditions
20%
Film Density
20%
Decomposition Mechanism
20%
Ag Segregation
20%
Film Resistance
20%
Magnetron Co-sputtering
20%
Cermet Electrode
20%
Complex Impedance Spectroscopy
20%
Porous Perovskite
20%
Material Science
Zirconia
100%
Thin Films
100%
Cermet
100%
Film
60%
Electrical Resistivity
40%
Volume Fraction
20%
Annealing
20%
Dielectric Spectroscopy
20%
Electrochemical Device
20%
Density
20%
Protective Coating
20%
Engineering
Thin Films
100%
Cermet
100%
Yttria-Stabilized Zirconia
60%
Interfacial Resistance
20%
Film Density
20%
Deposition Condition
20%
Cap Layer
20%
Magnetron
20%
Porosity
20%
Acoustic Impedance
20%