Design and initial performance of an ultrahigh vacuum sample preparation evaluation analysis and reaction (spear) system

C. Collazo-Davila, E. Landree, D. Grozea, G. Jayaram, R. Plass, Laurence Marks

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

Results concerning the calibration and use of a new ultrahigh vacuum (UHV) surface preparation and analysis system are reported. This Sample Preparation Evaluation Analysis and Reaction (SPEAR) side chamber system replaces an older surface side chamber that was attached to a Hitachi UHV H-9000 microscope. The system combines the ability to prepare clean surfaces using sample heating, cooling, ion milling, or thin film growth with surface analytical tools such as Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM), along with atomic surface structure information available from high-resolution transmission electron microscopy (HREM). The chemical sensitivity of the XPS and AES are demonstrated in preliminary studies of catalytic and semiconductor samples. In addition, the surface preparation capabilities are also demonstrated for the Si(100) and Ge(100) surfaces, including the ability to acquire secondary electron images during milling. During operation, the entire system is capable of maintaining the UHV conditions necessary for surface studies.

Original languageEnglish (US)
Pages (from-to)267-279
Number of pages13
JournalMicroscopy and Microanalysis
Volume1
Issue number6
DOIs
StatePublished - Jan 1 1995

Keywords

  • cal techniques
  • surface analyti-
  • surface science
  • transmission electron microscopy (TEM)
  • ultrahigh vacuum (UHV)

ASJC Scopus subject areas

  • Instrumentation

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