Abstract
The fabrication process as well as the optical characterization of a Far-field Superlens (FSL) is presented in detail. A FSL is capable of optically imaging well below the diffraction limit and works by enhancing and scattering evanescent waves to the far field which is then used to numerically reconstruct the object image [S. Durant, J. Opt. Soc. Am. B. 23(2006) 2383; Z. Liu, S. Durant, H. Lee, Y. Pikus, N. Fang, Y. Xiong, C. Sun, X. Zhang, Nano Lett. 7 (2007) 403]. We demonstrate the resolution of 70 nm gap distance of a three-line object in the far field. Also, a full optical imaging scheme, without the need for numerical processing, for a direct real-time subdiffraction-limited imaging is presented. Such remarkable imaging capability of FSL will revolutionize the optical imaging technique in the field of bio-imaging and nanolithography.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 202-207 |
| Number of pages | 6 |
| Journal | Solid State Communications |
| Volume | 146 |
| Issue number | 5-6 |
| DOIs | |
| State | Published - May 2008 |
Funding
This research is supported by the Center for Scalable and Integrated Nanomanufacturing (SINAM), and NSF Nanoscale Science and Engineering Center (NSEC) under award no. DMI-0327077, and Army Research Office MURI program (grant no. 50432-PHMUR).
Keywords
- A. Nanostructures
- B. Nanofabrications
- D. Optical properties
ASJC Scopus subject areas
- General Chemistry
- Condensed Matter Physics
- Materials Chemistry
