Deterministic assembly of releasable single crystal silicon-metal oxide field-effect devices formed from bulk wafers

Tae Il Kim, Yei Hwan Jung, Hyun Joong Chung, Ki Jun Yu, Numair Ahmed, Christopher J. Corcoran, Jae Suk Park, Sung Hun Jin, John A. Rogers*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

36 Scopus citations

Abstract

Deterministic assembly of ultrathin metal oxide-semiconductor field-effect transistors released from the surfaces of bulk wafers with (111) orientation provides a route to high quality electronics on nearly any type of substrate. Device parameters and bias stability characteristics from transistors on sheets of plastic confirm the effectiveness of the approach and the critical roles of thermally grown layers of silicon dioxide for the gate dielectrics and passivation layers. Systematic studies of the anisotropic etching processes used to release the devices illustrate capabilities into the sub-micron thickness regime, with beneficial effects on the bending stiffness and degree of bendability.

Original languageEnglish (US)
Article number182104
JournalApplied Physics Letters
Volume102
Issue number18
DOIs
StatePublished - May 6 2013

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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