Abstract
Recent work in Gabor x-ray holography has had a resolution limit imposed by the method used to extract the hologram information form the photoresist recording medium. In our case, we believe spiral distortions in the transmission electron microscope used for hologram readout limit resolution to 56 nm. To overcome this limitation we are building a scanning force microscope with a linear scanning stage offering < 20 nm resolution over a (70 μm × 70 μm) field and a field linearity of 1 part in 10,000. A field linearity yielding one half or less pixel registration error across the scan is desirable so that the resulting hologram reconstruction is not significantly degraded. This desire for a large and linear scanning field necessitated designing our own stage since these conditions could not be met commercially. It is our goal to use this microscope to achieve higher resolution in reconstructed holograms. In addition, it should offer a means to explore at a macromolecular level the resolution limit of resists, such as PMMA. In this report we describe the technical strategy employed to meet these specifications.
| Original language | English (US) |
|---|---|
| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Publisher | Publ by Int Soc for Optical Engineering |
| Pages | 213-222 |
| Number of pages | 10 |
| Volume | 1741 |
| ISBN (Print) | 0819409146 |
| State | Published - Jan 1 1993 |
| Event | Soft X-Ray Microscopy - San Diego, CA, USA Duration: Jul 19 1992 → Jul 21 1992 |
Other
| Other | Soft X-Ray Microscopy |
|---|---|
| City | San Diego, CA, USA |
| Period | 7/19/92 → 7/21/92 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics