Development of an end-point detector for parylene deposition process

Wongso Sutomo, Xuefeng Wang, David Bullen, Sarah K. Braden, Chang Liu*

*Corresponding author for this work

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

Parylene is an emerging material for MEMS. It is an organic material that is grown by using the chemical vapor deposition method at room temperature. The deposition thickness is commonly controlled by the amount of solid-phase dimer loaded in a sublimation chamber. In a conventional deposition machine, the end point of the process is designated by the moment the dimer is exhausted. However, this end-of-process criterion does not offer precise, repeatable control of film thickness. We present the results of the development of an in situ end-point detector for a Parylene chemical vapor deposition process. The detector is based on the thermal transfer principle and can be implemented on commercial Parylene deposition systems with minimal system modification. Such a sensor enables a user to stop the deposition when a targeted thickness is reached. The end point detector is very simple to implement on existing Parylene deposition systems. A series of such sensors with different target deposition thickness would allow extraction of the actual deposition rate within a deposition run.

Original languageEnglish (US)
Pages (from-to)64-69
Number of pages6
JournalJournal of Microelectromechanical Systems
Volume12
Issue number1
DOIs
StatePublished - Feb 1 2003

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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