Development of parallel dip pen nanolithography probe arrays for high throughput nanolithography

David A. Bullen*, Xuefeng Wang, Jun Zou, Sung Wook Chung, Chang Liu, Chad A. Mirkin

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

Dip Pen Nanolithography (DPN) is a lithographic technique that allows direct deposition of chemicals, metals, biological macromolecules, and other molecular "inks" with nanometer dimensions and precision. This paper addresses recent developments in the design and demonstration of high-density multiprobe DPN arrays. High-density arrays increase the process throughput over individual atomic force microscope (AFM) probes and are easier to use than arrays of undiced commercial probes. We have demonstrated passive arrays made of silicon (8 probes, 310 μm tip-to-tip spacing) and silicon nitride (32 probes, 100 μm tip-to-tip spacing). We have also demonstrated silicon nitride "active" arrays (10 probes, 100 μm tip-to-tip spacing) that have embedded thermal actuators for individual probe control. An optimization model for these devices, based on a generalized multilayer thermal actuator, is also described.

Original languageEnglish (US)
Pages (from-to)141-150
Number of pages10
JournalMaterials Research Society Symposium - Proceedings
Volume758
StatePublished - Sep 5 2003
EventRapid Prototyping Technologies - Boston, MA, United States
Duration: Dec 3 2002Dec 5 2002

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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