Diffusion-limited photopolymerization in scanning micro-stereolithography

N. Fang; C. Sun; X. Zhang

doi:10.1007/s00339-004-2938-x

Diffusion-limited photopolymerization in scanning micro-stereolithography

N. Fang, C. Sun, X. Zhang^*

^*Corresponding author for this work

Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

55 Scopus citations

Abstract

The trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process.

Original language	English (US)
Pages (from-to)	1839-1842
Number of pages	4
Journal	Applied Physics A: Materials Science and Processing
Volume	79
Issue number	8
DOIs	https://doi.org/10.1007/s00339-004-2938-x
State	Published - Dec 1 2004

ASJC Scopus subject areas

Chemistry(all)
Materials Science(all)

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abstract = "The trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process.",

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AB - The trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process.

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Diffusion-limited photopolymerization in scanning micro-stereolithography

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