Diffusion-limited photopolymerization in scanning micro-stereolithography

N. Fang, C. Sun, X. Zhang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

38 Scopus citations

Abstract

The trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process.

Original languageEnglish (US)
Pages (from-to)1839-1842
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume79
Issue number8
DOIs
StatePublished - Dec 1 2004

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

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