Dip Pen Nanolithography™ and its potential for nanoelectronics

Bjoern Rosner, Nabil Amro, Sandeep Disawal, Linette Demers, Hua Zhang, Jeff Rendien, Terrisa Duenas, Roger Shile, Joe Fragala, Robert Elghanian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations


Dip Pen Nanolithography (DPN™) is a patterning technique for nanoscale science and engineering based on scanning probe microscopy. Its main advantages are very high resolution, the unique capability to deposit many different materials directly onto a substrate and low cost of ownership. We present here new research and development efforts that demonstrate the potential of DPN as a tool to produce nanoelectronic devices and circuits. We show the direct deposition of electronic materials as well as the use of external accessories to accelerate the development phase of nanoelectronic components.

Original languageEnglish (US)
Title of host publication2004 4th IEEE Conference on Nanotechnology
Number of pages3
StatePublished - 2004
Externally publishedYes
Event2004 4th IEEE Conference on Nanotechnology - Munich, Germany
Duration: Aug 16 2004Aug 19 2004

Publication series

Name2004 4th IEEE Conference on Nanotechnology


Other2004 4th IEEE Conference on Nanotechnology


  • AFM
  • CMP
  • DPN
  • Dip pen
  • Nanoelectronics
  • Nanolithography
  • Nanotube
  • Scanning probe

ASJC Scopus subject areas

  • Engineering(all)


Dive into the research topics of 'Dip Pen Nanolithography™ and its potential for nanoelectronics'. Together they form a unique fingerprint.

Cite this