Dip-pen nanolithography-based methodology for preparing arrays of nanostructures functionalized with oligonucleotides

H. Zhang, Z. Li, C. A. Mirkin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

105 Scopus citations

Abstract

The process of using dip-pen nanolithography (DPN) to easily fabricate functionalized arrays of inorganic nanopatterns was demonstrated. These structures can be modified with alkanethiol-capped oligonucleotides, which retain their hybridization properties on the surfaces of the nanopatterns and react with complementary DNA or particles modified with complementary DNA. This type of procedures may be useful for generating hybrid soft/hard structures composed of metal nanofeatures interfaced with adsorbates that exhibit a high chemical affinity for them.

Original languageEnglish (US)
Pages (from-to)1472-1474
Number of pages3
JournalAdvanced Materials
Volume14
Issue number20
DOIs
StatePublished - Oct 16 2002

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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