Dip-pen nanolithography: Controlling surface architecture on the sub-100 nanometer length scale

Chad A. Mirkin; Seunghun Hong; Linette Demers

doi:10.1002/1439-7641(20010119)2:1<37::AID-CPHC37>3.0.CO;2-K

Dip-pen nanolithography: Controlling surface architecture on the sub-100 nanometer length scale

Chad A. Mirkin^*, Seunghun Hong, Linette Demers

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

56 Scopus citations

Abstract

A new method for patterning surfaces with organic structures, termed "dip-pen" nanolithography (DPN), has been developed. DPN allows one to deliver collections of molecules to a surface in a positive printing mode. The technique offers 15 nm linewidths and 5 nm spatial resolution. Current capabilities and future applications of DPN are discussed.

Original language	English (US)
Pages (from-to)	37-39
Number of pages	3
Journal	ChemPhysChem
Volume	2
Issue number	1
DOIs	https://doi.org/10.1002/1439-7641(20010119)2:1<37::AID-CPHC37>3.0.CO;2-K
State	Published - Jan 19 2001

Keywords

Lithography
Nanostructures
Surfaces

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Physical and Theoretical Chemistry

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10.1002/1439-7641(20010119)2:1<37::AID-CPHC37>3.0.CO;2-K

Cite this

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AU - Hong, Seunghun

AU - Demers, Linette

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Y1 - 2001/1/19

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KW - Lithography

KW - Nanostructures

KW - Surfaces

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Dip-pen nanolithography: Controlling surface architecture on the sub-100 nanometer length scale

Abstract

Keywords

ASJC Scopus subject areas

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