Dip-pen nanolithography: Controlling surface architecture on the sub-100 nanometer length scale

Chad A. Mirkin*, Seunghun Hong, Linette Demers

*Corresponding author for this work

Research output: Contribution to journalArticle

54 Scopus citations

Abstract

A new method for patterning surfaces with organic structures, termed "dip-pen" nanolithography (DPN), has been developed. DPN allows one to deliver collections of molecules to a surface in a positive printing mode. The technique offers 15 nm linewidths and 5 nm spatial resolution. Current capabilities and future applications of DPN are discussed.

Original languageEnglish (US)
Pages (from-to)37-39
Number of pages3
JournalChemPhysChem
Volume2
Issue number1
DOIs
StatePublished - Jan 19 2001

Keywords

  • Lithography
  • Nanostructures
  • Surfaces

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Physical and Theoretical Chemistry

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