Dip-pen nanolithography of high-melting-temperature molecules

Ling Huang, Yu Hsu Chang, Joseph J. Kakkassery, Chad A. Mirkin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

17 Scopus citations

Abstract

Direct nanopatterning of a number of high-melting-temperature molecules has been systematically investigated by dip-pen nanolithography (DPN). By tuning DPN experimental conditions, all of the high-melting-temperature molecules transported smoothly from the atomic force microscope (AFM) tip to the surface at room temperature without tip preheating. Water meniscus formation between the tip and substrate is found to play a critical role in patterning high-melting-temperature molecules. These results show that heating an AFM probe to a temperature above the ink's melting temperature is not a prerequisite for ink delivery, which extends the current "ink-substrate" combinations available to DPN users.

Original languageEnglish (US)
Pages (from-to)20756-20758
Number of pages3
JournalJournal of Physical Chemistry B
Volume110
Issue number42
DOIs
StatePublished - Oct 26 2006

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

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