Dip-pen nanopatterning of photosensitive conducting polymer using a monomer ink

Ming Su; Mohammed Aslam; Lei Fu; Nianqiang Wu; Vinayak P. Dravid

doi:10.1063/1.1737469

Dip-pen nanopatterning of photosensitive conducting polymer using a monomer ink

Ming Su, Mohammed Aslam, Lei Fu, Nianqiang Wu, Vinayak P. Dravid^*

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

60 Scopus citations

Abstract

An improved monomer ink in dip-pen nanolithography (DPN) was used to analyze the nanopatterning of the conducting polymers. After patterning, the nominal monomer ink is converted to its conducting solid-state polymeric form. An appropriate rate to match the operation of DPN was given by optimizing the ratios of the reactants. Excellent response, recovery and sensitivity parameters are exhibited by the miniaturized conducting polymer sensors with light detection ability using the improved ink formula.

Original language	English (US)
Pages (from-to)	4200-4202
Number of pages	3
Journal	Applied Physics Letters
Volume	84
Issue number	21
DOIs	https://doi.org/10.1063/1.1737469
State	Published - May 24 2004

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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abstract = "An improved monomer ink in dip-pen nanolithography (DPN) was used to analyze the nanopatterning of the conducting polymers. After patterning, the nominal monomer ink is converted to its conducting solid-state polymeric form. An appropriate rate to match the operation of DPN was given by optimizing the ratios of the reactants. Excellent response, recovery and sensitivity parameters are exhibited by the miniaturized conducting polymer sensors with light detection ability using the improved ink formula.",

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AU - Wu, Nianqiang

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Dip-pen nanopatterning of photosensitive conducting polymer using a monomer ink

Abstract

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