Dip-pen nanopatterning of photosensitive conducting polymer using a monomer ink

Ming Su, Mohammed Aslam, Lei Fu, Nianqiang Wu, Vinayak P. Dravid*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

58 Scopus citations

Abstract

An improved monomer ink in dip-pen nanolithography (DPN) was used to analyze the nanopatterning of the conducting polymers. After patterning, the nominal monomer ink is converted to its conducting solid-state polymeric form. An appropriate rate to match the operation of DPN was given by optimizing the ratios of the reactants. Excellent response, recovery and sensitivity parameters are exhibited by the miniaturized conducting polymer sensors with light detection ability using the improved ink formula.

Original languageEnglish (US)
Pages (from-to)4200-4202
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number21
DOIs
StatePublished - May 24 2004

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Dip-pen nanopatterning of photosensitive conducting polymer using a monomer ink'. Together they form a unique fingerprint.

Cite this