Nitty gritty: A chemically amplified poly-(methylsilsesquioxane) resist based on the acid-catalyzed condensation of silanol end groups was developed for direct fabrication of hybrid 3D microstructures (see picture) by conformal and maskless proximity-field nanopatterning. Fibers, colloidal particles, helical arrays, and photonic crystals were fabricated by varying phase-mask design and exposure conditions. (Figure Presented).
|Original language||English (US)|
|Number of pages||5|
|Journal||Angewandte Chemie - International Edition|
|State||Published - 2009|
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