Direct patterning of quantum dot nanostructures via electron beam lithography

Vikas Nandwana, Chandramouleeswaran Subramani, Yi Cheun Yeh, Boqian Yang, Stefan Dickert, Michael D. Barnes, Mark T. Tuominen, Vincent M. Rotello*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

34 Scopus citations

Abstract

Patterned quantum dot (QD) nanostructures were prepared by direct electron beam lithography on QD films. Time resolved photoluminescence measurements show that the optical properties of these QDs were retained after cross-linking.

Original languageEnglish (US)
Pages (from-to)16859-16862
Number of pages4
JournalJournal of Materials Chemistry
Volume21
Issue number42
DOIs
StatePublished - Nov 14 2011
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Chemistry

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