Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

Idan Hod; Wojciech Bury; David M. Karlin; Pravas Deria; Chung Wei Kung; Michael J. Katz; Monica So; Benjamin Klahr; Danni Jin; Yip Wah Chung; Teri W. Odom; Omar K. Farha; Joseph T. Hupp

doi:10.1002/adma.201401940

Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

Idan Hod, Wojciech Bury, David M. Karlin, Pravas Deria, Chung Wei Kung, Michael J. Katz, Monica So, Benjamin Klahr, Danni Jin, Yip Wah Chung, Teri W. Odom, Omar K. Farha, Joseph T. Hupp^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

224 Scopus citations

Abstract

Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.

Original language	English (US)
Pages (from-to)	6295-6300
Number of pages	6
Journal	Advanced Materials
Volume	26
Issue number	36
DOIs	https://doi.org/10.1002/adma.201401940
State	Published - Sep 1 2014

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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title = "Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition",

abstract = "Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.",

author = "Idan Hod and Wojciech Bury and Karlin, {David M.} and Pravas Deria and Kung, {Chung Wei} and Katz, {Michael J.} and Monica So and Benjamin Klahr and Danni Jin and Chung, {Yip Wah} and Odom, {Teri W.} and Farha, {Omar K.} and Hupp, {Joseph T.}",

note = "Publisher Copyright: {\textcopyright} 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.",

year = "2014",

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doi = "10.1002/adma.201401940",

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T1 - Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

AU - Hod, Idan

AU - Bury, Wojciech

AU - Karlin, David M.

AU - Deria, Pravas

AU - Kung, Chung Wei

AU - Katz, Michael J.

AU - So, Monica

AU - Klahr, Benjamin

AU - Jin, Danni

AU - Chung, Yip Wah

AU - Odom, Teri W.

AU - Farha, Omar K.

AU - Hupp, Joseph T.

PY - 2014/9/1

Y1 - 2014/9/1

N2 - Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.

AB - Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.

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JO - Advanced Materials

JF - Advanced Materials

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ER -

Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

Abstract

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