Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence

Yoon Kyeung Lee, Ki Jun Yu, Yerim Kim, Younghee Yoon, Zhaoqian Xie, Enming Song, Haiwen Luan, Xue Feng, Yonggang Huang, John A Rogers*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Accelerated dissolution, High ionic concentrations for all ion types, Higher pH, At sirmilar ionic strength and pH, Ca'catalyzes the dissolution more effectively than monovalent cations (Na + K + )and Mg 2 especially at higher Ph, HPO/-at high ionic strength, Reduced dissolution rate, Silicic acid at high ionic strength.

Original languageEnglish (US)
Title of host publicationPoster Sessions 2017 - Core Programming Area at the 2017 AIChE Annual Meeting
PublisherAIChE
Number of pages1
ISBN (Electronic)9781510858145
StatePublished - Jan 1 2017
EventPoster Sessions 2017 - Core Programming Area at the 2017 AIChE Annual Meeting - Minneapolis, United States
Duration: Oct 29 2017Nov 3 2017

Publication series

NamePoster Sessions 2017 - Core Programming Area at the 2017 AIChE Annual Meeting
Volume2

Other

OtherPoster Sessions 2017 - Core Programming Area at the 2017 AIChE Annual Meeting
CountryUnited States
CityMinneapolis
Period10/29/1711/3/17

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Lee, Y. K., Yu, K. J., Kim, Y., Yoon, Y., Xie, Z., Song, E., Luan, H., Feng, X., Huang, Y., & Rogers, J. A. (2017). Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence. In Poster Sessions 2017 - Core Programming Area at the 2017 AIChE Annual Meeting (Poster Sessions 2017 - Core Programming Area at the 2017 AIChE Annual Meeting; Vol. 2). AIChE.