TY - JOUR
T1 - Downscaling of n-channel organic field-effect transistors with inkjet-printed electrodes
AU - Cheng, Xiaoyang
AU - Caironi, Mario
AU - Noh, Yong Young
AU - Newman, Christopher
AU - Wang, Jianpu
AU - Lee, Mi Jung
AU - Banger, Kal
AU - Di Pietro, Riccardo
AU - Facchetti, Antonio
AU - Sirringhaus, Henning
N1 - Funding Information:
The authors would like to thank Dr. Ni Zhao, Dr. Enrico Gili, Dr. Jui-fen Chang, Dr. S. Lu, Dr. Z. Chen and Feng Gao for experimental support. Polyera Corporation acknowledges the Flextech Allience for the support of ActivInk development. This work was supported by the EU Integrated Project NAIMO (NMP4-CT-2004-500355).
PY - 2012/2
Y1 - 2012/2
N2 - In this contribution we demonstrate for the first time a downscaled n-channel organic field-effect transistors based on N,N′- dialkylsubstituted-(1,7&1,6)-dicyanoperylene-3,4:9,10-bis(dicarboximide) with inkjet printed electrodes. First we demonstrate that the use of a high boiling point solvent is critical to achieve extended crystalline domains in spin-coated thin films and thus high electron mobility >0.1 cm2 V-1 s-1 in top-gate devices. Then inkjet-printing is employed to realize sub-micrometer scale channels by dewetting of silver nanoparticles off a first patterned gold contact. By employing a 50 nm crosslinked fluoropolymer gate dielectric, ∼200 nm long channel transistors can achieve good current saturation when operated <5 V with good bias stress stability.
AB - In this contribution we demonstrate for the first time a downscaled n-channel organic field-effect transistors based on N,N′- dialkylsubstituted-(1,7&1,6)-dicyanoperylene-3,4:9,10-bis(dicarboximide) with inkjet printed electrodes. First we demonstrate that the use of a high boiling point solvent is critical to achieve extended crystalline domains in spin-coated thin films and thus high electron mobility >0.1 cm2 V-1 s-1 in top-gate devices. Then inkjet-printing is employed to realize sub-micrometer scale channels by dewetting of silver nanoparticles off a first patterned gold contact. By employing a 50 nm crosslinked fluoropolymer gate dielectric, ∼200 nm long channel transistors can achieve good current saturation when operated <5 V with good bias stress stability.
KW - Bias stress stability
KW - Contact resistance
KW - Inkjet printing
KW - Organic field-effect transistor
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U2 - 10.1016/j.orgel.2011.12.001
DO - 10.1016/j.orgel.2011.12.001
M3 - Article
AN - SCOPUS:84255163225
SN - 1566-1199
VL - 13
SP - 320
EP - 328
JO - Organic Electronics: physics, materials, applications
JF - Organic Electronics: physics, materials, applications
IS - 2
ER -