DPN-generated nanostructures as positive resists for preparing lithographic masters or hole arrays

Khalid S. Salaita; Seung Woo Lee; David S. Ginger; Chad A. Mirkin

doi:10.1021/nl061719t

DPN-generated nanostructures as positive resists for preparing lithographic masters or hole arrays

Khalid S. Salaita, Seung Woo Lee, David S. Ginger, Chad A. Mirkin^*

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

39 Scopus citations

Abstract

Experiments that utilize structures generated by dip-pen nanolithography (DPN) as positive resists for fabricating nanohole arrays and lithographic masters are described. The technique takes advantage of the difference in desorption potentials for patterned structures made from 16-mercaptohexadecanoic acid (MHA) and 1-octadecanethiol (ODT), respectively. In this approach, patterns of MHA on gold are generated by DPN, and surrounding areas are passivated by ODT. Electrochemistry is used to selectively remove the MHA nanofeatures made by DPN. The exposed gold can be used as an electrode to plate silver from solution, generating raised features and structures that can be transferred to PDMS to make a lithographic master, or alternatively, they can be etched to make arrays of nanoholes.

Original language	English (US)
Pages (from-to)	2493-2498
Number of pages	6
Journal	Nano letters
Volume	6
Issue number	11
DOIs	https://doi.org/10.1021/nl061719t
State	Published - Nov 2006

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

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title = "DPN-generated nanostructures as positive resists for preparing lithographic masters or hole arrays",

abstract = "Experiments that utilize structures generated by dip-pen nanolithography (DPN) as positive resists for fabricating nanohole arrays and lithographic masters are described. The technique takes advantage of the difference in desorption potentials for patterned structures made from 16-mercaptohexadecanoic acid (MHA) and 1-octadecanethiol (ODT), respectively. In this approach, patterns of MHA on gold are generated by DPN, and surrounding areas are passivated by ODT. Electrochemistry is used to selectively remove the MHA nanofeatures made by DPN. The exposed gold can be used as an electrode to plate silver from solution, generating raised features and structures that can be transferred to PDMS to make a lithographic master, or alternatively, they can be etched to make arrays of nanoholes.",

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T1 - DPN-generated nanostructures as positive resists for preparing lithographic masters or hole arrays

AU - Salaita, Khalid S.

AU - Lee, Seung Woo

AU - Ginger, David S.

AU - Mirkin, Chad A.

PY - 2006/11

Y1 - 2006/11

N2 - Experiments that utilize structures generated by dip-pen nanolithography (DPN) as positive resists for fabricating nanohole arrays and lithographic masters are described. The technique takes advantage of the difference in desorption potentials for patterned structures made from 16-mercaptohexadecanoic acid (MHA) and 1-octadecanethiol (ODT), respectively. In this approach, patterns of MHA on gold are generated by DPN, and surrounding areas are passivated by ODT. Electrochemistry is used to selectively remove the MHA nanofeatures made by DPN. The exposed gold can be used as an electrode to plate silver from solution, generating raised features and structures that can be transferred to PDMS to make a lithographic master, or alternatively, they can be etched to make arrays of nanoholes.

AB - Experiments that utilize structures generated by dip-pen nanolithography (DPN) as positive resists for fabricating nanohole arrays and lithographic masters are described. The technique takes advantage of the difference in desorption potentials for patterned structures made from 16-mercaptohexadecanoic acid (MHA) and 1-octadecanethiol (ODT), respectively. In this approach, patterns of MHA on gold are generated by DPN, and surrounding areas are passivated by ODT. Electrochemistry is used to selectively remove the MHA nanofeatures made by DPN. The exposed gold can be used as an electrode to plate silver from solution, generating raised features and structures that can be transferred to PDMS to make a lithographic master, or alternatively, they can be etched to make arrays of nanoholes.

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DPN-generated nanostructures as positive resists for preparing lithographic masters or hole arrays

Abstract

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