DPN-generated nanostructures as positive resists for preparing lithographic masters or hole arrays

Khalid S. Salaita, Seung Woo Lee, David S. Ginger, Chad A. Mirkin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

38 Scopus citations

Abstract

Experiments that utilize structures generated by dip-pen nanolithography (DPN) as positive resists for fabricating nanohole arrays and lithographic masters are described. The technique takes advantage of the difference in desorption potentials for patterned structures made from 16-mercaptohexadecanoic acid (MHA) and 1-octadecanethiol (ODT), respectively. In this approach, patterns of MHA on gold are generated by DPN, and surrounding areas are passivated by ODT. Electrochemistry is used to selectively remove the MHA nanofeatures made by DPN. The exposed gold can be used as an electrode to plate silver from solution, generating raised features and structures that can be transferred to PDMS to make a lithographic master, or alternatively, they can be etched to make arrays of nanoholes.

Original languageEnglish (US)
Pages (from-to)2493-2498
Number of pages6
JournalNano letters
Volume6
Issue number11
DOIs
StatePublished - Nov 2006

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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