Abstract
The effect of etching's verticality on the reflection loss of strongly-guiding SOI or weakly-guiding III-V etched facet reflector (EFR) is studied. High tolerance on tilt makes SOI EFR much more resilient to etching deviation.
Original language | English (US) |
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Title of host publication | Frontiers in Optics, FiO 2008 |
Publisher | Optical Society of America |
ISBN (Print) | 9781557528612 |
State | Published - Jan 1 2008 |
Event | Frontiers in Optics, FiO 2008 - Rochester, NY, United States Duration: Oct 19 2008 → Oct 23 2008 |
Other
Other | Frontiers in Optics, FiO 2008 |
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Country/Territory | United States |
City | Rochester, NY |
Period | 10/19/08 → 10/23/08 |
ASJC Scopus subject areas
- Instrumentation
- Atomic and Molecular Physics, and Optics