Abstract
The effect of etching's verticality on the reflection loss of strongly-guiding SOI or weakly-guiding III-V etched facet reflector (EFR) is studied. High tolerance on tilt makes SOI EFR much more resilient to etching deviation.
| Original language | English (US) |
|---|---|
| Title of host publication | Frontiers in Optics, FiO 2008 |
| Publisher | Optical Society of America |
| ISBN (Print) | 9781557528612 |
| State | Published - Jan 1 2008 |
| Event | Frontiers in Optics, FiO 2008 - Rochester, NY, United States Duration: Oct 19 2008 → Oct 23 2008 |
Other
| Other | Frontiers in Optics, FiO 2008 |
|---|---|
| Country/Territory | United States |
| City | Rochester, NY |
| Period | 10/19/08 → 10/23/08 |
ASJC Scopus subject areas
- Instrumentation
- Atomic and Molecular Physics, and Optics