@inproceedings{853d67a1fe87489596cf7576968671d6,
title = "Effect of etched sidewall tilt on the reflection loss of silicon-on-insulator (SOI) or III-V etched facet reflector",
abstract = "The effect of etching's verticality on the reflection loss of strongly-guiding SOI or weakly-guiding III-V etched facet reflector (EFR) is studied. High tolerance on tilt makes SOI EFR much more resilient to etching deviation.",
author = "Yunan Zheng and Yingyan Huang and Ho, {Seng Tiong}",
year = "2008",
doi = "10.1364/fio.2008.jwa78",
language = "English (US)",
isbn = "9781557528612",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of America (OSA)",
booktitle = "Laser Science, LS 2008",
note = "Laser Science, LS 2008 ; Conference date: 19-10-2008 Through 23-10-2008",
}