Effect of resistance-area product on spin-transfer switching in MgO-based magnetic tunnel junction memory cells

Z. M. Zeng; P. Khalili Amiri; G. Rowlands; H. Zhao; I. N. Krivorotov; J. P. Wang; J. A. Katine; J. Langer; K. Galatsis; K. L. Wang; H. W. Jiang

doi:10.1063/1.3556615

Effect of resistance-area product on spin-transfer switching in MgO-based magnetic tunnel junction memory cells

Z. M. Zeng, P. Khalili Amiri, G. Rowlands, H. Zhao, I. N. Krivorotov, J. P. Wang, J. A. Katine, J. Langer, K. Galatsis, K. L. Wang, H. W. Jiang

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

50 Scopus citations

Abstract

We use ultrafast current-induced switching measurements to study spin-transfer switching performance metrics, such as write energy per bit (E_W) and switching current density (J_c), as a function of resistance-area product (RA) (hence MgO thickness) in magnetic tunnel junction cells used for magnetoresistive random access memory (MRAM). E_W increases with RA, while J_c decreases with increasing RA for both switching directions. The results are discussed in terms of RA optimization for low write energy and current drive capability (hence density) of the MRAM cells. Switching times <2 ns and write energies <0.3 pJ are demonstrated for 135 nm×65 nm CoFeB/MgO/CoFeB devices.

Original language	English (US)
Article number	072512
Journal	Applied Physics Letters
Volume	98
Issue number	7
DOIs	https://doi.org/10.1063/1.3556615
State	Published - Feb 14 2011

Funding

We would like to acknowledge fruitful discussions with Y. Huai. This work was supported by the DARPA STT-RAM program (HR0011-09-C-0114) and the Nanoelectronics Research Initiative (NRI) through the Western Institute of Nanoelectronics (WIN).

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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@article{e8ad55c149694984ac32df8ca66ba2a9,

title = "Effect of resistance-area product on spin-transfer switching in MgO-based magnetic tunnel junction memory cells",

abstract = "We use ultrafast current-induced switching measurements to study spin-transfer switching performance metrics, such as write energy per bit (EW) and switching current density (Jc), as a function of resistance-area product (RA) (hence MgO thickness) in magnetic tunnel junction cells used for magnetoresistive random access memory (MRAM). EW increases with RA, while Jc decreases with increasing RA for both switching directions. The results are discussed in terms of RA optimization for low write energy and current drive capability (hence density) of the MRAM cells. Switching times <2 ns and write energies <0.3 pJ are demonstrated for 135 nm×65 nm CoFeB/MgO/CoFeB devices.",

author = "Zeng, {Z. M.} and {Khalili Amiri}, P. and G. Rowlands and H. Zhao and Krivorotov, {I. N.} and Wang, {J. P.} and Katine, {J. A.} and J. Langer and K. Galatsis and Wang, {K. L.} and Jiang, {H. W.}",

note = "Funding Information: We would like to acknowledge fruitful discussions with Y. Huai. This work was supported by the DARPA STT-RAM program (HR0011-09-C-0114) and the Nanoelectronics Research Initiative (NRI) through the Western Institute of Nanoelectronics (WIN).",

year = "2011",

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doi = "10.1063/1.3556615",

language = "English (US)",

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journal = "Applied Physics Letters",

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T1 - Effect of resistance-area product on spin-transfer switching in MgO-based magnetic tunnel junction memory cells

AU - Zeng, Z. M.

AU - Khalili Amiri, P.

AU - Rowlands, G.

AU - Zhao, H.

AU - Krivorotov, I. N.

AU - Wang, J. P.

AU - Katine, J. A.

AU - Langer, J.

AU - Galatsis, K.

AU - Wang, K. L.

AU - Jiang, H. W.

N1 - Funding Information: We would like to acknowledge fruitful discussions with Y. Huai. This work was supported by the DARPA STT-RAM program (HR0011-09-C-0114) and the Nanoelectronics Research Initiative (NRI) through the Western Institute of Nanoelectronics (WIN).

PY - 2011/2/14

Y1 - 2011/2/14

N2 - We use ultrafast current-induced switching measurements to study spin-transfer switching performance metrics, such as write energy per bit (EW) and switching current density (Jc), as a function of resistance-area product (RA) (hence MgO thickness) in magnetic tunnel junction cells used for magnetoresistive random access memory (MRAM). EW increases with RA, while Jc decreases with increasing RA for both switching directions. The results are discussed in terms of RA optimization for low write energy and current drive capability (hence density) of the MRAM cells. Switching times <2 ns and write energies <0.3 pJ are demonstrated for 135 nm×65 nm CoFeB/MgO/CoFeB devices.

AB - We use ultrafast current-induced switching measurements to study spin-transfer switching performance metrics, such as write energy per bit (EW) and switching current density (Jc), as a function of resistance-area product (RA) (hence MgO thickness) in magnetic tunnel junction cells used for magnetoresistive random access memory (MRAM). EW increases with RA, while Jc decreases with increasing RA for both switching directions. The results are discussed in terms of RA optimization for low write energy and current drive capability (hence density) of the MRAM cells. Switching times <2 ns and write energies <0.3 pJ are demonstrated for 135 nm×65 nm CoFeB/MgO/CoFeB devices.

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JF - Applied Physics Letters

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Effect of resistance-area product on spin-transfer switching in MgO-based magnetic tunnel junction memory cells

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