Effects of deposition time duration on thermal diffusivity of hydrogenated amorphous carbon films

Yun Young Kim*, Hasan Adli Alwi, Rozidawati Awang, Sridhar Krishnaswamy

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

In the present investigation we study the effects of film-deposition time duration on thermal diffusivity (α) of hydrogenated amorphous carbon (a-C:H) thin-films grown in a radio-frequency (RF) plasma enhanced chemical vapor deposition system. A set of films was deposited at 50W RF power for 40, 60, 80, and 100 min. Film characteristics were determined from the optical transmission spectroscopy, Fourier Transform Infrared spectroscopy, and Raman spectroscopy. Thermal diffusivity of a-C:H films was evaluated using the optical pump-and-probe technique on the aluminum-coated samples. Results show a trend of increase in - as the deposition time increases due to the microstructural changes associated with longer exposure to ion bombardment effects on the growth surface of the films.

Original languageEnglish (US)
Article number125602
JournalJapanese Journal of Applied Physics
Volume50
Issue number12
DOIs
StatePublished - Dec 1 2011

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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