TY - JOUR
T1 - Effects of deposition time duration on thermal diffusivity of hydrogenated amorphous carbon films
AU - Kim, Yun Young
AU - Alwi, Hasan Adli
AU - Awang, Rozidawati
AU - Krishnaswamy, Sridhar
PY - 2011/12
Y1 - 2011/12
N2 - In the present investigation we study the effects of film-deposition time duration on thermal diffusivity (α) of hydrogenated amorphous carbon (a-C:H) thin-films grown in a radio-frequency (RF) plasma enhanced chemical vapor deposition system. A set of films was deposited at 50W RF power for 40, 60, 80, and 100 min. Film characteristics were determined from the optical transmission spectroscopy, Fourier Transform Infrared spectroscopy, and Raman spectroscopy. Thermal diffusivity of a-C:H films was evaluated using the optical pump-and-probe technique on the aluminum-coated samples. Results show a trend of increase in - as the deposition time increases due to the microstructural changes associated with longer exposure to ion bombardment effects on the growth surface of the films.
AB - In the present investigation we study the effects of film-deposition time duration on thermal diffusivity (α) of hydrogenated amorphous carbon (a-C:H) thin-films grown in a radio-frequency (RF) plasma enhanced chemical vapor deposition system. A set of films was deposited at 50W RF power for 40, 60, 80, and 100 min. Film characteristics were determined from the optical transmission spectroscopy, Fourier Transform Infrared spectroscopy, and Raman spectroscopy. Thermal diffusivity of a-C:H films was evaluated using the optical pump-and-probe technique on the aluminum-coated samples. Results show a trend of increase in - as the deposition time increases due to the microstructural changes associated with longer exposure to ion bombardment effects on the growth surface of the films.
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U2 - 10.1143/JJAP.50.125602
DO - 10.1143/JJAP.50.125602
M3 - Article
AN - SCOPUS:82955237785
SN - 0021-4922
VL - 50
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 12
M1 - 125602
ER -