Effects of reactive annealing on the structure of poly(methacrylic acid)-poly(methyl methacrylate) diblock copolymer thin films

Yan Sun, Kevin J. Henderson, Zhang Jiang, Joseph W. Strzalka, Jin Wang, Kenneth R. Shull*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

We monitor the structural evolution of a poly(tert-butyl methacrylate)-poly(methyl methacrylate) (PtBMA-PMMA) diblock copolymer thin film undergoing conversion via reactive annealing to yield poly(methacrylic acid)-poly(methyl methacrylate) (PMAA-PMMA). Using grazing-incidence small-angle X-ray scattering (GISAXS) and atomic force microscopy (AFM), we confirm the generation of well-ordered cylindrical microdomains in the PtBMA-PMMA precursor film after solvent annealing. After initiating thermal deprotection, the high degree of ordering can be maintained up to 25% conversion of the diblock into PMAA-PMMA. Beyond this point, a significant decrease in the overall film thickness associated with the conversion process cannot accommodate the hexagonal lattice adopted by the cylindrical microdomains. At the same time, rearrangement of PMMA cores in a PtBMA matrix that is becoming progressively glassier presents further difficulties in maintaining a reasonable structure. The fully converted PMAA-PMMA film contains a system of cylindrical microdomains that lack good ordering.

Original languageEnglish (US)
Pages (from-to)6525-6531
Number of pages7
JournalMacromolecules
Volume44
Issue number16
DOIs
StatePublished - Aug 23 2011

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

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