Abstract
We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model. The program provides accurate modeling of etching process with high spatial resolution. Implementation of a dynamic CA technique has resulted in increased simulation speed and reduced memory requirements. A first ACES software based on PC platforms has been realized.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 943-946 |
| Number of pages | 4 |
| Journal | International Conference on Solid-State and Integrated Circuit Technology Proceedings |
| State | Published - Dec 1 1998 |
ASJC Scopus subject areas
- General Engineering