Efficient PC-based preferential-etch simulator using dynamic Cellular Automata method

Zhenjun Zhu*, Chang Liu

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model. The program provides accurate modeling of etching process with high spatial resolution. Implementation of a dynamic CA technique has resulted in increased simulation speed and reduced memory requirements. A first ACES software based on PC platforms has been realized.

Original languageEnglish (US)
Pages (from-to)943-946
Number of pages4
JournalInternational Conference on Solid-State and Integrated Circuit Technology Proceedings
StatePublished - Dec 1 1998

ASJC Scopus subject areas

  • Engineering(all)

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