Electron beam induced fragmentation of fullerene derivatives

A. P.G. Robinson*, R. E. Palmer, T. Tada, T. Kanayama, J. A. Preece, D. Philp, U. Jonas, F. Deiderich

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

37 Scopus citations

Abstract

Spin coating has been used to produce films of various chemical derivatives of C60 on the hydrogen terminated silicon (100) surface. Irradiation of these films using a 20 keV electron beam has been found to reduce substantially their dissolution rate in organic solvents such as monochlorobenzene and chloroform. Raman and FTIR spectroscopy have shown that the reduced solubility of the derivative films is due to fragmentation of the molecules. The electron dose threshold of the derivative films for fragmentation is between 10-3 and 10-2 C/cm2, suggesting that these derivatives could be used as electron beam resists.

Original languageEnglish (US)
Pages (from-to)586-590
Number of pages5
JournalChemical Physics Letters
Volume289
Issue number5-6
DOIs
StatePublished - Jun 19 1998

ASJC Scopus subject areas

  • General Physics and Astronomy
  • Physical and Theoretical Chemistry

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