Electron beam induced fragmentation of fullerene derivatives

A. P.G. Robinson; R. E. Palmer; T. Tada; T. Kanayama; J. A. Preece; D. Philp; U. Jonas; F. Deiderich

doi:10.1016/S0009-2614(98)00455-2

Electron beam induced fragmentation of fullerene derivatives

A. P.G. Robinson^*, R. E. Palmer, T. Tada, T. Kanayama, J. A. Preece, D. Philp, U. Jonas, F. Deiderich

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

37 Scopus citations

Abstract

Spin coating has been used to produce films of various chemical derivatives of C₆₀ on the hydrogen terminated silicon (100) surface. Irradiation of these films using a 20 keV electron beam has been found to reduce substantially their dissolution rate in organic solvents such as monochlorobenzene and chloroform. Raman and FTIR spectroscopy have shown that the reduced solubility of the derivative films is due to fragmentation of the molecules. The electron dose threshold of the derivative films for fragmentation is between 10^-3 and 10^-2 C/cm², suggesting that these derivatives could be used as electron beam resists.

Original language	English (US)
Pages (from-to)	586-590
Number of pages	5
Journal	Chemical Physics Letters
Volume	289
Issue number	5-6
DOIs	https://doi.org/10.1016/S0009-2614(98)00455-2
State	Published - Jun 19 1998

ASJC Scopus subject areas

Physics and Astronomy(all)
Physical and Theoretical Chemistry

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@article{3d8261d7fb074a8d89d82de416ef54b4,

title = "Electron beam induced fragmentation of fullerene derivatives",

abstract = "Spin coating has been used to produce films of various chemical derivatives of C60 on the hydrogen terminated silicon (100) surface. Irradiation of these films using a 20 keV electron beam has been found to reduce substantially their dissolution rate in organic solvents such as monochlorobenzene and chloroform. Raman and FTIR spectroscopy have shown that the reduced solubility of the derivative films is due to fragmentation of the molecules. The electron dose threshold of the derivative films for fragmentation is between 10-3 and 10-2 C/cm2, suggesting that these derivatives could be used as electron beam resists.",

author = "Robinson, {A. P.G.} and Palmer, {R. E.} and T. Tada and T. Kanayama and Preece, {J. A.} and D. Philp and U. Jonas and F. Deiderich",

note = "Funding Information: The authors would like to thank Dr. M.R.C. Hunt and Dr. A.W. Robinson for many useful discussions. This work was partly supported by the New Energy and Industrial Technology Development Organization (NEDO) through the management of the {\AA}ngstr{\"o}m Technology Partnership (ATP). APGR would like to thank the Engineering and Physical Sciences Research Council (EPSRC), UK, and NAIR, Japan, for financial support. We are also grateful to the British Council for financial support of our UK–Japan research collaboration.",

year = "1998",

month = jun,

day = "19",

doi = "10.1016/S0009-2614(98)00455-2",

language = "English (US)",

volume = "289",

pages = "586--590",

journal = "Chemical Physics Letters",

issn = "0009-2614",

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number = "5-6",

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TY - JOUR

T1 - Electron beam induced fragmentation of fullerene derivatives

AU - Robinson, A. P.G.

AU - Palmer, R. E.

AU - Tada, T.

AU - Kanayama, T.

AU - Preece, J. A.

AU - Philp, D.

AU - Jonas, U.

AU - Deiderich, F.

N1 - Funding Information: The authors would like to thank Dr. M.R.C. Hunt and Dr. A.W. Robinson for many useful discussions. This work was partly supported by the New Energy and Industrial Technology Development Organization (NEDO) through the management of the Ångström Technology Partnership (ATP). APGR would like to thank the Engineering and Physical Sciences Research Council (EPSRC), UK, and NAIR, Japan, for financial support. We are also grateful to the British Council for financial support of our UK–Japan research collaboration.

PY - 1998/6/19

Y1 - 1998/6/19

N2 - Spin coating has been used to produce films of various chemical derivatives of C60 on the hydrogen terminated silicon (100) surface. Irradiation of these films using a 20 keV electron beam has been found to reduce substantially their dissolution rate in organic solvents such as monochlorobenzene and chloroform. Raman and FTIR spectroscopy have shown that the reduced solubility of the derivative films is due to fragmentation of the molecules. The electron dose threshold of the derivative films for fragmentation is between 10-3 and 10-2 C/cm2, suggesting that these derivatives could be used as electron beam resists.

AB - Spin coating has been used to produce films of various chemical derivatives of C60 on the hydrogen terminated silicon (100) surface. Irradiation of these films using a 20 keV electron beam has been found to reduce substantially their dissolution rate in organic solvents such as monochlorobenzene and chloroform. Raman and FTIR spectroscopy have shown that the reduced solubility of the derivative films is due to fragmentation of the molecules. The electron dose threshold of the derivative films for fragmentation is between 10-3 and 10-2 C/cm2, suggesting that these derivatives could be used as electron beam resists.

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U2 - 10.1016/S0009-2614(98)00455-2

DO - 10.1016/S0009-2614(98)00455-2

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SN - 0009-2614

VL - 289

SP - 586

EP - 590

JO - Chemical Physics Letters

JF - Chemical Physics Letters

IS - 5-6

ER -

Electron beam induced fragmentation of fullerene derivatives

Abstract

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