TY - JOUR
T1 - Electronic and magnetotransport properties of ferromagnetic p -(In,Mn)As n -InAs heterojunctions
AU - May, S. J.
AU - Wessels, B. W.
N1 - Funding Information:
This work is supported by the NSF under the Spin Electronics Program ECS-0224210. Extensive use of the facilities of the Materials Research Center at Northwestern University supported by NSF DMR 0076097 is acknowledged.
PY - 2005
Y1 - 2005
N2 - The electronic and magnetotransport properties of epitaxial p -(In,Mn)As n -InAs heterojunctions have been studied. The junctions were formed by depositing ferromagnetic (In,Mn)As films on InAs (100) substrates using metal-organic vapor phase epitaxy. The current-voltage characteristics of the junctions have been measured from 78 to 295 K. At temperatures below 150 K, ohmic current dominate transport at low bias, followed by defect-assisted tunneling current with increasing bias. At high forward bias, junction transport is dominated by diffusion current. The magnetoresistance of the junctions was measured as a function of forward bias and applied magnetic field. The magnitude and field dependence of the longitudinal magnetoresistance depend directly on the junction transport mechanism. Under high bias, a magnetoresistance of 15.7% at 78 K and 8% at 295 K in a 4400 Oe field was measured in an In0.96Mn0.04As InAs junction. At 78 K, the high bias magnetoresistance increases linearly with magnetic field from 1000 to 4600 Oe.
AB - The electronic and magnetotransport properties of epitaxial p -(In,Mn)As n -InAs heterojunctions have been studied. The junctions were formed by depositing ferromagnetic (In,Mn)As films on InAs (100) substrates using metal-organic vapor phase epitaxy. The current-voltage characteristics of the junctions have been measured from 78 to 295 K. At temperatures below 150 K, ohmic current dominate transport at low bias, followed by defect-assisted tunneling current with increasing bias. At high forward bias, junction transport is dominated by diffusion current. The magnetoresistance of the junctions was measured as a function of forward bias and applied magnetic field. The magnitude and field dependence of the longitudinal magnetoresistance depend directly on the junction transport mechanism. Under high bias, a magnetoresistance of 15.7% at 78 K and 8% at 295 K in a 4400 Oe field was measured in an In0.96Mn0.04As InAs junction. At 78 K, the high bias magnetoresistance increases linearly with magnetic field from 1000 to 4600 Oe.
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U2 - 10.1116/1.1942506
DO - 10.1116/1.1942506
M3 - Article
AN - SCOPUS:31144464941
SN - 1071-1023
VL - 23
SP - 1769
EP - 1772
JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
IS - 4
ER -