The shallow implantation of Bi species was analyzed for energy densities above 2 Jcm-2. The implantation range was shown to depend on the energy density used for ablation, which was related to the velocity of the Bi atoms and ions in the plasma. The kinetic energy of the Bi species in the plume generated at laser energy densities above 2 J cm-2 was estimated to be around 200 eV.
|Original language||English (US)|
|Number of pages||3|
|Journal||Journal of Applied Physics|
|Issue number||10 1|
|State||Published - May 15 2003|
ASJC Scopus subject areas
- Physics and Astronomy(all)