Experimental and computational studies of phase shift lithography with binary elastomeric masks

Keyphrases

• Computational Study 100%
• Phase-shift Lithography 100%
• Finite Element Calculation 50%
• Phase Shift 50%
• Elastomer 50%
• Near-field 50%
• Intensity Distribution 50%
• Multicrystalline Silicon 50%
• Polydimethylsiloxane 50%
• Conformal Contact 50%
• Subtle Features 50%
• Prepolymer 50%
• Photoresist 50%
• Photolithographic 50%
• Full Vector 50%
• Phase Mask 50%
• Representative Structures 50%
• Optical Effects 50%
• Scanning Optical Microscopy 50%
• Vector Finite Element 50%

Engineering

• Conformal Contact 100%
• Polydimethylsiloxane 100%
• Finite Element Computation 100%
• Lithography 100%
• Silicon Single Crystal 100%
• Illustrates 100%
• Phase Mask 100%
• Elastomer 100%
• Photoresist 100%
• Phase Shift 100%

Material Science

• Poly(Dimethylsiloxane) 100%
• Prepolymer 100%
• Elastomer 100%
• Lithography 100%
• Conformal Contact 100%
• Finite Element Methods 100%
• Silicon 100%
• Single Crystal 100%