Experimental surface charge density of the Si (100) -2×1H surface

J. Ciston*, L. D. Marks, R. Feidenhans'l, O. Bunk, G. Falkenberg, E. M. Lauridsen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Scopus citations


We report a three-dimensional charge density refinement from x-ray diffraction intensities of the Si (100) 2×1H surface. By paying careful attention to parameterizing the bulk Si bonding, we are able to locate the hydrogen atoms at the surface, which could not be done previously. In addition, we are able to partially refine the local charge density at the surface. We find experimentally an increased, slightly localized bond density of approximately 0.31 electrons between each Si atom pair at the surface. Both the atomic positions and the charge density are in remarkably good agreement with density-functional theory calculations.

Original languageEnglish (US)
Article number085401
JournalPhysical Review B - Condensed Matter and Materials Physics
Issue number8
StatePublished - 2006

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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