Exposure strategies for polymethyl methacrylate from in situ x-ray absorption near edge structure spectroscopy

X. Zhang*, C. Jacobsen, S. Lindaas, S. Williams

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

61 Scopus citations

Abstract

We have observed the chemical changes in PMMA irradiated by x rays in situ. The chemical changes are monitored by micro-x-ray absorption near edge structure spectra at the carbon absorption edge. The loss of the ester group (C=O) and formation of C=C bonds have been determined quantitatively from changes in the intensities of the respective π* resonant peaks as a function of dose. Samples prepared under different conditions were examined. From the dose dependence of bond formation, scission and linking, the performance of the resist can be predicted, so that the preparation strategy, dose, and development can be optimized.

Original languageEnglish (US)
Pages (from-to)1477-1483
Number of pages7
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume13
Issue number4
DOIs
StatePublished - Jul 1995
EventProceedings of the 22nd Annual Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-22) - Scottsdale, AZ, USA
Duration: Jan 8 1995Jan 12 1995

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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