Abstract
A super hydrophobic surface is realized by forming double roughness on a silicon surface. A deep silicon etching and a gas phase isotropic silicon etching (XeF2) are used as the fabrication method for two different scales of roughness. Combination of these two techniques enables the uniform formation of double roughness on a silicon surface. The fabricated surface shows the tendency of preferring Cassie state [1] to Wenzel state [2] and a durable super hydrophobic property. Through a series of experiments, this study also offers a verification of the previous theoretical prediction [3] for the amplification of contact angle on a surface with double roughness.
Original language | English (US) |
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Title of host publication | Proceedings of the 11th International Conference on Miniaturized Systems for Chemistry and Life Sciences, uTAS 2007 |
Editors | Jean-Louis Viovy, Patrick Tabeling, Stephanie Descroix, Laurent Malaquin |
Publisher | Chemical and Biological Microsystems Society |
Pages | 1795-1797 |
Number of pages | 3 |
ISBN (Electronic) | 9780979806407 |
State | Published - 2007 |
Event | 11th International Conference on Miniaturized Systems for Chemistry and Life Sciences, uTAS 2007 - Paris, France Duration: Oct 7 2007 → Oct 11 2007 |
Publication series
Name | Proceedings of the 11th International Conference on Miniaturized Systems for Chemistry and Life Sciences, uTAS 2007 |
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Conference
Conference | 11th International Conference on Miniaturized Systems for Chemistry and Life Sciences, uTAS 2007 |
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Country/Territory | France |
City | Paris |
Period | 10/7/07 → 10/11/07 |
Funding
This work was supported by the NSI-NCRC program of KOSEF (R15-2003-032-01002-0(2006)), and Micro Thermal System Research Center (ERC) (R11-2001-095-03001-0).
Keywords
- Cassie state
- Contact angle
- Contact angle hysteresis
- Double roughness
- Micro roughness
- Nano roughness
- Super hydrophobic surface
- Wenzel state
ASJC Scopus subject areas
- Chemical Engineering (miscellaneous)
- Bioengineering