Fabricating three dimensional nanostructures using two photon lithography in a single exposure step

Seokwoo Jeon, Viktor Malyarchuk, John A. Rogers*, Gary P. Wiederrecht

*Corresponding author for this work

Research output: Contribution to journalArticle

97 Scopus citations

Abstract

Conformable phase masks, transparent photopolymers and two photon effects provide the basis for a simple, parallel lithographic technique that can form complex, but well defined three dimensional (3D) nanostructures in a single exposure step. This paper describes the method, presents examples of its ability to form 3D nanostructures (including free standing particles with controlled shapes) and comprehensive modeling of the associated optics. Single step, large area 3D pattern definition, subwavelength resolution and experimental simplicity represent features that make this method potentially useful for applications in photonics, biotechnology and other areas.

Original languageEnglish (US)
Pages (from-to)2300-2308
Number of pages9
JournalOptics Express
Volume14
Issue number6
DOIs
StatePublished - Mar 2006

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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